Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Ulrich Schweitzer"'
Publikováno v:
IEEE Journal of Photovoltaics. 5:1179-1187
We study the appearance of both scribing failures and Cu-rich debris, formed during Cu(In,Ga)Se $_2$ (CIGS) co-evaporation, in electroluminescence (EL) and dark lock-in thermography (DLIT) images. We observe that for most of the defect types, there i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b93c015172367d6637ae1bb4b492b1d0
https://doi.org/10.1109/jphotov.2015.2422143
https://doi.org/10.1109/jphotov.2015.2422143
Autor:
Andreas Schulz, Ulrich Stroth, H. Muegge, Ulrich Schweitzer, K.-M. Baumgärtner, Matthias Walker, U. Schumacher
Publikováno v:
Contributions to Plasma Physics. 47:505-509
A new type of plasma source, the Microwave Concentrator Stack, presented in this paper is a device of a geometry that can be described as an elliptical cylinder with additional metallic structures for shaping the electric field in its inside. The bas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7d25aece358a912e4be8995562c9d389
https://doi.org/10.1002/ctpp.200710065
https://doi.org/10.1002/ctpp.200710065
Autor:
Matthias Walker, Leni Steiner, Andreas Schulz, Jochen Krüger, Ulrich Schweitzer, Ulrich Stroth
Publikováno v:
Plasma Processes and Polymers. 4:S826-S830
The presented low-pressure microwave plasma device Plasmodul® is a flexible and powerful tool for the deposition of large area barrier coatings based on silicon nitride. The chemical film composition of the coatings can be derived from FT-IR analysi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::71f3b16e135f3fe6c1334298082acc7d
https://doi.org/10.1002/ppap.200731914
https://doi.org/10.1002/ppap.200731914
Autor:
U. Schumacher, Andreas Schulz, Klaus-Martin Baumgärtner, Ulrich Schweitzer, Matthias Walker, Ulrich Stroth
Publikováno v:
Plasma Processes and Polymers. 4:S978-S981
A new type of plasma source to maintain a free-standing, linearly extended plasma was studied. The plasma reactor is a microwave concentrator which is comprised of a cylindrical cavity with an elliptical base and a microwave antenna near one of its f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::40ad6574076c544b8a5f7b0c2c032ac7
https://doi.org/10.1002/ppap.200732311
https://doi.org/10.1002/ppap.200732311
Autor:
Joachim Schneider, J. Krüger, U. Schumacher, Andreas Schulz, Ulrich Schweitzer, Matthias Walker
Publikováno v:
Surface and Coatings Technology. 200:639-643
Pulsed plasmas are of increasing importance for applications of high rate film deposition or etching processes under low plasma induced damage. The deposition rate and the characteristics of silicon nitride films can be strongly influenced by a suita
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::19a2422a7a7ba07318c07f5066208b84
https://doi.org/10.1016/j.surfcoat.2005.01.112
https://doi.org/10.1016/j.surfcoat.2005.01.112
Autor:
Matthias Graf, E. Rauchle, Lukas Alberts, Christian Hunyar, Ulrich Stroth, A. Schultz, Ulrich Schweitzer, Mathias Kaiser, Matthias Walker
Publikováno v:
2008 IEEE 35th International Conference on Plasma Science.
Summary form only given. Low pressure plasma reactors usually suffer from contamination of their plasma generating device. We designed a "remote", electrode less, free standing plasma source which is linearly extendable. Using a bifocal geometry for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::af310a90db34e15f35f8e329d2e7e260
https://doi.org/10.1109/plasma.2008.4591051
https://doi.org/10.1109/plasma.2008.4591051