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Publikováno v:
Microelectronic Engineering. 83:730-733
The gain of up to a factor of two in resolution by an integrative method is investigated. Starting from a literature survey and an application scenario the line shrink method was selected and an experiment designed. State of the art 193nm lithography
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::22def6e1b2672298f8ff18b736241a55
https://doi.org/10.1016/j.mee.2006.01.160
https://doi.org/10.1016/j.mee.2006.01.160
