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Autor:
Matthias Slodowski, Wolfgang Dorl, Joachim Heinitz, Matthias W. Klein, Thomas Elster, Hans-Joachim Doering, Ulf Weidenmüller, Ines A. Stolberg, Marc Schneider
Publikováno v:
Alternative Lithographic Technologies IV.
In the ITRS roadmap [1] increasingly long mask write and cycle time is explicitly addressed as a difficult challenge in mask fabrication for the 16nm technology node and beyond. Write time reduction demands have to be seen in relation to correspondin