Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Udy Danino"'
Autor:
Wei-Guo Lei, Joan McCall, Rajesh Nagpal, Jun Kim, Vivek Balasubramanian, Mark Wagner, Udy Danino, Suheil J. Zaatri, Michael Ben-Yishai, Lev Faivishevsky, Tejas H. Shah, Shmoolik Mangan, Michael Penn, Oded Dassa, Aviram Tam
Publikováno v:
SPIE Proceedings.
Die-to-Model (D2M) inspection is an innovative approach to running inspection based on a mask design layout data. The D2M concept takes inspection from the traditional domain of mask pattern to the preferred domain of the wafer aerial image. To achie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::43a2d0664643cf72e3b4d1e250d79f4a
https://doi.org/10.1117/12.829637
https://doi.org/10.1117/12.829637
