List of contributors

Autor: Juan Andrés, Noé Arjona, K. Asokan, Irfan Ayoub, Susanta Bera, S. Chattopadhyay, Rajneesh Chaurasiya, Fan Chen, Rafael Aparecido Ciola Amoresi, Ubirajara Coleto Junior, Gustavo Martini Dalpian, P.K. Das, Wenjing Du, Somrita Dutta, Brahim El Filali, Vincenzo Esposito, M.A. Frechero, Keval Gadani, Muthu Kumaran Gnanamani, Minerva Guerra-Balcázar, Amin Hamed Mashhadzadeh, D. Jana, Yanyan Jiang, D. Paul Joseph, A.D. Joshi, Ahsanul Kabir, Vinayak Kamble, Hasmat Khan, Vladimir Kolkovsky, M. Kovendhan, Vijay Kumar, Rajan Kumar Singh, Mohan Lal Meena, Hui Li, Way Foong Lim, Shawn D. Lin, Wei Liu, Jiurong Liu, Elson Longo, Chung-Hsin Lu, Yingjie Ma, P. Mallick, Antonio Claudio Michejevs Padilha, M.C. Molina, A. Mondal, Atanu Naskar, S. Pal, Leinig Antonio Perazolli, Georgiy Polupan, Jothi Ramalingam Rajabathar, R. Ramarajan, Alexandre Reily Rocha, Mohammad Reza Saeb, Azam Salmankhani, A. Sarkar, Rishabh Sehgal, Rakesh Sehgal, N.A. Shah, Vishal Sharma, V.G. Shrimali, Alexandre Zirpoli Simões, P.S. Solanki, Sudipta Som, Christos Spitas, Ronald Stübner, Jayashree Swaminathan, Hendrik C. Swart, S. Terny, K. Thangaraju, Victor Buratto Tinti, Lorena Álvarez-Contreras, Tetyana V. Torchynska, Isaac Velázquez-Hernández, Zhou Wang, Fenglong Wang, Lili Wu, Daniel Zanetti de Florio, Maryam Zarghami Dehghani, Xingfan Zhang, Xue Zhang, Peiru Zheng

Publikováno v: Metal Oxide Defects ISBN: 9780323855884

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b9c5e6af963096c7776abd11a70da558
https://doi.org/10.1016/b978-0-323-85588-4.01002-3