Zobrazeno 1 - 10
of 114
pro vyhledávání: '"U. Zastrow"'
Autor:
F.C. Maier, Markus Hülsbeck, Stefan Haas, Wolfhard Beyer, Uwe Breuer, U. Zastrow, C. Maurer, Uwe Rau
Publikováno v:
Thin Solid Films. 653:223-228
The hydrogen concentration in hydrogenated amorphous silicon (a-Si:H), produced by plasma-enhanced chemical vapor deposition, was measured by Raman and Fourier transform infrared spectroscopy before and after thermal annealing. The possibility of Ram
Autor:
Stefan Haas, U. Zastrow, Gudrun Andrä, Wolfhard Beyer, Florian C. Maier, Andreas Lambertz, Friedhelm Finger, Norbert H. Nickel, Annett Gawlik, J. Bergmann, Uwe Breuer
Publikováno v:
Journal of applied physics 124(15), 153103-(2018). doi:10.1063/1.5038090
Rapid thermal annealing by, e.g., laser scanning of hydrogenated amorphous silicon (a-Si:H) films is of interest for device improvement and for development of new device structures for solar cell and large area display application. For well controlle
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::57cf1fc0240662f0edeb08eda5281ac0
https://juser.fz-juelich.de/record/859760
https://juser.fz-juelich.de/record/859760
Autor:
J. Bergmann, Uwe Breuer, Friedhelm Finger, T. Schmidt, U. Zastrow, Norbert H. Nickel, Wolfhard Beyer, Andreas Lambertz, Tsvetelina Merdzhanova, Frank Pennartz
Publikováno v:
MRS Proceedings. 1770:1-6
Laser and oven annealing effects on hydrogen concentration, hydrogen diffusion and material microstructure in hydrogenated amorphous silicon films deposited on crystalline silicon substrates are compared. For laser annealing, a 6 W green (532 nm) con
Publikováno v:
Canadian Journal of Physics. 92:774-777
The effects of postdeposition air exposure of microcrystalline silicon films, prepared at varied deposition rates, are investigated. The changes in the oxygen content, evaluated from Fourier transform infrared spectroscopy measurements, were studied
Autor:
W. Beyer, U. Breuer, R. Carius, W. Hilgers, D. Lennartz, F.C. Maier, N.H. Nickel, F. Pennartz, P. Prunici, U. Zastrow
Publikováno v:
Canadian Journal of Physics. 92:700-704
The influence of implanted hydrogen (up to a concentration level of 3 at. %) on the microstructure of silicon (Si) materials is investigated by Fourier transform infrared spectroscopy as well as by effusion of hydrogen and of (low dose) implanted hel
Autor:
Florian Ruske, U. Zastrow, Dieter Greiner, Jürgen Hüpkes, J. Hotovy, Jorj I. Owen, M. Wimmer, Reiner Klenk
Publikováno v:
Thin Solid Films. 555:48-52
Zinc oxide is widely used as transparent contact in thin film solar cells. We investigate the damp heat stability of aluminum doped ZnO (ZnO:Al) films sputter deposited at different conditions. Increase in resistivity upon damp heat exposure was obse
Publikováno v:
Thin Solid Films. 540:251-255
Single-chamber processes for the deposition of high efficiency thin-film silicon tandem cells of an a-Si:H p-i-n (top cell)/μc-Si:H p-i-n (bottom cell) structure involving short fabrication time are reported. An industry relevant reactor and an exci
Autor:
Aad Gordijn, Wolfhard Beyer, Tsvetelina Merdzhanova, T. Kilper, J. Woerdenweber, Helmut Stiebig, U. Zastrow, Matthias Meier
Publikováno v:
Journal of Non-Crystalline Solids. 358:2171-2178
The influence of oxygen and nitrogen impurities on the material properties of a-Si:H and μc-Si:H films and on the corresponding solar cell performances was studied. For intentional contamination of the i-layer the impurities were inserted by two con
Autor:
Wolfhard Beyer, U. Zastrow, AJ Arjan Flikweert, Aad Gordijn, Helmut Stiebig, Tsvetelina Merdzhanova, T. Zimmermann, J. Woerdenweber
Publikováno v:
Solar Energy Materials and Solar Cells. 98:146-153
For deposition of a-Si:H p–i–n solar cells, a single-chamber plasma enhanced chemical vapor deposition process at the frequency of 13.56 MHz is developed. A 40×40 cm² deposition chamber, which represents typical industry reactors equipped with
Publikováno v:
Applied Physics A. 105:355-362
This paper investigates laser scribing of a-Si:H layers from the film side with a ns pulsed UV laser for thin-film solar modules. We compared the contact resistance for several scribing methods and find that a low contact resistance is only achieved