Zobrazeno 1 - 10
of 47
pro vyhledávání: '"U. Rasbach"'
Autor:
Dieter Meschede, U. Rasbach, B. Viaris de Lesegno, Colm O'Dwyer, G. Georgiev, D. Haubrich, K. Ludolph, M. Müller, Egbert Oesterschulze, John Weiner, M. Mützel
Publikováno v:
Applied Physics B. 80:941-944
The atom pencil we describe here is a versatile tool that writes arbitrary structures by atomic deposition in a serial lithographic process. This device consists of a transversely laser-cooled and collimated cesium atomic beam that passes through a 4
Autor:
Karsten Buse, Angela Kunoth, Dieter Meschede, M. Mützel, U. Rasbach, Jürgen Braun, K. Peithmann, Carsten Burstedde
Publikováno v:
Applied Physics B. 77:1-9
The method of neutral atom lithography allows one to transfer to a substrate a 2D intensity modulation of an atomic beam imposed by an inhomogeneous light field. The complexity of the pattern depends on the properties of the light field constructed f
Publikováno v:
The Journal of Chemical Physics. 111:2968-2972
In previous experiments, a nearly complete vibrational spectrum of the CS2 molecule in the Σg+ state has been obtained using a laser induced fluorescence method. The statistical tests of the random matrix theory, applied on this spectrum, suggest a
Autor:
Onofrio M. Maragò, Barbara Fazio, C. Weber, B. Klöter, U. Rasbach, Andrea Camposeo, Dieter Meschede, Ennio Arimondo
Publikováno v:
Applied physics. B, Lasers and optics
85 (2006): 487–491.
info:cnr-pdr/source/autori:A. Camposeo; O.M. Maragò; B.Fazio; B. Kloter; D. Meschede; U. Rasbach; C. Weber; E. Arimondo/titolo:Resist-assisted atom lithography with group III elements/doi:/rivista:Applied physics. B, Lasers and optics (Print)/anno:2006/pagina_da:487/pagina_a:491/intervallo_pagine:487–491/volume:85
85 (2006): 487–491.
info:cnr-pdr/source/autori:A. Camposeo; O.M. Maragò; B.Fazio; B. Kloter; D. Meschede; U. Rasbach; C. Weber; E. Arimondo/titolo:Resist-assisted atom lithography with group III elements/doi:/rivista:Applied physics. B, Lasers and optics (Print)/anno:2006/pagina_da:487/pagina_a:491/intervallo_pagine:487–491/volume:85
Resist-assisted atom lithography with group III elements, specifically with gallium and indium, is demonstrated. Self-assembled monolayers (SAM) of nonanethiols prepared on thin sputtered gold films were exposed to a beam of neutral gallium and indiu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4bf860ce80641f40edec08b7953aff1b
https://publications.cnr.it/doc/39522
https://publications.cnr.it/doc/39522
Autor:
David Sarkisyan, Vanessa Leung, T. Varzhapetyan, R. dela Torre, B. Klöter, J. Wang, U. Rasbach, Dieter Meschede
Publikováno v:
Physical Review A. 70
Autor:
David Sarkisyan, R. dela Torre, U. Rasbach, T. Varzhapetyan, B. Klöter, J. Wang, Dieter Meschede, Vanessa Leung
Publikováno v:
Physical Review A. 70
We present saturation and polarization laser spectroscopy experiments of indium vapor with a single color on the 410 nm transition and with two colors at 410 and 451 nm. The spectra observed by polarization spectroscopy are discussed in terms of a qu
Publikováno v:
Optics Communications
Optics Communications, Elsevier, 1998, 156 (1-3), pp.178-187. ⟨10.1016/S0030-4018(98)00399-X⟩
Optics Communications, Elsevier, 1998, 156 (1-3), pp.178-187. ⟨10.1016/S0030-4018(98)00399-X⟩
International audience; An Infrared-Ultraviolet Double Resonance (IR-UV DR) experiment has been built in order to resolve and identify single rotational levels in dense molecular spectra. The system is based on a CO laser, working on the CO fundament
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7202a962fea9707326aa9656047ec6ff
https://hal.archives-ouvertes.fr/hal-01118289
https://hal.archives-ouvertes.fr/hal-01118289
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