Zobrazeno 1 - 1
of 1
pro vyhledávání: '"U. Mierau Inge. Vermeir"'
Autor:
David Rentkiewicz, Masato Shigematus, U. Mierau Inge. Vermeir, M. Market, Nickolay Stephanko, Francis M. Houlihan, Daniel Miller, Etsuo Kawaguchi, Andrew R. Romano, Toshiro Itani, Ralph R. Dammel, Raj Sakamuri, Christoph Hohle, Sill Conley
Publikováno v:
Journal of Photopolymer Science and Technology. 17:621-630
Further work is described on a new generation of more transparent, 157 nm resist platforms, which are based upon capping of fluoroalcohol-substituted, transparent perfluorinated resins (TFR) with a tert-butoxycarbonylmethyl (BOCME) moiety. By optimiz