Zobrazeno 1 - 5
of 5
pro vyhledávání: '"U. K. Klostermann"'
Publikováno v:
Journal of Physics D: Applied Physics. 34:2117-2122
Magnetic tunnel junctions in the sub-micrometre range have been patterned by electron beam lithography. The hard reference electrode is composed of an artificial antiferromagnetic subsystem while the soft magnetic detection layer is Permalloy (NiFe).
Autor:
Günther Bayreuther, R. Kinder, U. K. Klostermann, Joachim Dr. Wecker, L. Bär, Joachim Bangert, G. Rupp
Publikováno v:
Journal of Magnetism and Magnetic Materials. 240:314-316
When magnetic tunnel junctions (MTJ) are built into a memory device they will be arranged in a matrix; therefore some of the not addressed elements will be exposed to a significant field during the switching of one element. It has to be avoided that
Autor:
L. Bär, Günter Reiss, H. Boeve, U. K. Klostermann, Joachim Bangert, Ralf Richter, Joachim Dr. Wecker
Publikováno v:
Journal of Magnetism and Magnetic Materials. 240:127-129
Spin-dependent tunnelling elements are widely studied due to their possible application in electronic devices. Here we focus on field programmable logic devices. We introduce the concepts and demonstrate experimentally the functionality of reprogramm
Publikováno v:
SPIE Proceedings.
In this paper, we discuss the performance of EUV resist models in terms of predictive accuracy, and we assess the readiness of the corresponding model calibration methodology. The study is done on an extensive OPC data set collected at IMEC for the S
Autor:
G. Miiller, M. Ruhrig, F. Dahmani, Michael Kund, U. K. Klostermann, Franz Kreupl, U. Griming, M. Angerbauer
Publikováno v:
2007 IEEE International Electron Devices Meeting.
We report on a novel spin torque select MRAM with perpendicular anisotropy (P-ST-MRAM). The P-ST concept offers superior scalability performance at the 28 nm technology node compared to the conventional in-plane spin torque MRAM (I-ST-MRAM). The crit