Zobrazeno 1 - 1
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pro vyhledávání: '"U F Behringer"'
Autor:
B A Anderer, U F Behringer
Publikováno v:
Microelectronic Engineering. 5:67-71
Self supporting, thin membranes, generally used for masks in electron-, ion-beam or X-ray mask feature transfer systems, contain a tensile stress causing mask distortions. We describe a new method to determine the average membrane stress by the measu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5e68f18bb1fbfb63ea0a1f60f63761fe
https://doi.org/10.1016/0167-9317(86)90031-6
https://doi.org/10.1016/0167-9317(86)90031-6
