Zobrazeno 1 - 10
of 31
pro vyhledávání: '"U D, Zeitner"'
Autor:
T A, Goebel, M, Heusinger, R G, Krämer, C, Matzdorf, T O, Imogore, D, Richter, U D, Zeitner, S, Nolte
Publikováno v:
Optics express. 28(24)
We present an innovative concept of a semi-aperiodic phase mask design that enables the realization of multi-notch fiber Bragg gratings (FBG). This design utilizes the overlap and interference of near-infrared ultrashort laser pulses diffracted by sh
Publikováno v:
Optical Sensors and Sensing Congress.
We present new dispersive optical components, namely TIR-GRISMs, that exhibit three advantages when compared to standard diffraction gratings. First, high diffraction efficiency, second, enormous angular dispersion and, third, a nearly constant angul
Publikováno v:
CEAS Space Journal. 9:433-440
For high-resolution spectroscopy in space, GRISM elements-obtained by patterning gratings onto a prism surface-find increasing applications. We report on GRISM manufacturing by joining the individual functional elements-prisms and gratings-to suitabl
Publikováno v:
International Conference on Space Optics — ICSO 2016.
By uniting a grating with a prism to a GRISM compound, the optical characteristics of diffractive and refractive elements can be favorably combined to achieve outstanding spectral resolution features. Ruling the grating structure into the prism surfa
Publikováno v:
International Conference on Space Optics — ICSO 2016.
Light scattering can critically affect the performance of high-end optical systems. For instance, unavoidable but small residual imperfections of optical components such as surface or coating roughness, bulk inhomogeneities, and defects as well as th
Mask aligner lithography is a well-established back-end fabrication process in microlithography. Within the last few years, resolution enhancement techniques have been transferred and adapted from projection lithography to further develop mask aligne
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::91745411faffeb0d9510e50c781c67eb
https://publica.fraunhofer.de/handle/publica/250693
https://publica.fraunhofer.de/handle/publica/250693
Publikováno v:
Proceedings IRS² 2017.
Publikováno v:
32nd European Mask and Lithography Conference.
Photomasks contain geometric information that will be transferred to substrates or pre-structured surfaces. Conventional mask aligner lithography in the sense of shadow printing of the photomask suffers from limited achievable resolution. Photomask a
Autor:
U. D. Zeitner, Thomas Flügel-Paul, Gerhard Kalkowski, Tino Benkenstein, Torsten Harzendorf, Andre Matthes
Publikováno v:
SPIE Proceedings.
We report about our latest achievements to realize the diffraction gratings during the development activities for a future Earth observation high resolution spectrometer studied by ESA. The gratings are manufactured by electron beam lithography on fu
Autor:
Marko Stumpf, Sylke Kleinle, Philipp Schleicher, Andre Matthes, Andreas Bräuer, U. D. Zeitner, Hans-Christoph Eckstein
Publikováno v:
2015 20th Microoptics Conference (MOC).
We have developed a novel LED projection based direct write grayscale lithography system for the fabrication of micro-optical freeform surfaces, micro-lenses, diffusors and diffractive optics. In the present publication, we show the benefit of this n