Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Tzu‐I Chuang"'
Publikováno v:
BMC Anesthesiology, Vol 23, Iss 1, Pp 1-9 (2023)
Abstract Background Blood urea nitrogen to albumin ratio (BAR) is increasingly recognized as an early predictor for short-term outcomes in critically ill patients, but the association of BAR with long-term outcomes in critically ill surgical patients
Externí odkaz:
https://doaj.org/article/d13a3d1ad2ec4a5b9b6d839058f254ce
Autor:
Tzu‐I Chuang, Pin‐Kuei Fu
Publikováno v:
Respirology Case Reports, Vol 12, Iss 1, Pp n/a-n/a (2024)
Abstract Chronic pulmonary aspergillosis (CPA) often manifests in patients with a history of pulmonary tuberculosis and is typically characterized by recurrent hemoptysis, weight loss, and frequently coexists with poorly controlled diabetes. While we
Externí odkaz:
https://doaj.org/article/a86aec313b8245dc91b0e9304e335d4f
Autor:
Tzu-I Chuang, 莊子誼
97
In this study, the micro- and nanocrystalline silicon thin films prepared by the high density plasma chemical vapor deposition, can be used to improve the electric property of the thin film transistors and solar cell devices. This experiment
In this study, the micro- and nanocrystalline silicon thin films prepared by the high density plasma chemical vapor deposition, can be used to improve the electric property of the thin film transistors and solar cell devices. This experiment
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/07915073573214995962
Autor:
Tzu-I Chuang, 莊子誼
97
In this study, the micro- and nanocrystalline silicon thin films prepared by the high density plasma chemical vapor deposition, can be used to improve the electric property of the thin film transistors and solar cell devices. This experiment
In this study, the micro- and nanocrystalline silicon thin films prepared by the high density plasma chemical vapor deposition, can be used to improve the electric property of the thin film transistors and solar cell devices. This experiment
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/76133750505317804833