Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Tung-Feng Yeh"'
Autor:
TUNG-FENG YEH, 葉東豐
96
The purpose of this study is to explore the situation of the sheltered employment for psychiatric disabilities from service providers’ aspects and to detect the problems about existed system and its operation, further, as the suggestions fo
The purpose of this study is to explore the situation of the sheltered employment for psychiatric disabilities from service providers’ aspects and to detect the problems about existed system and its operation, further, as the suggestions fo
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/42308526767035592095
Autor:
Libuše Šroubková, Peter A. Mirau, Zhenglin Yan, Rudolf Zahradník, Tung-Feng Yeh, David G. Schmidling, Arnost Reiser
Publikováno v:
Macromolecules. 34:2901-2907
Interaction between OH groups can produce large acidity increases in phenolic systems. We report here on the behavior of a group of oligomers of p-cresol, where the cresol units are linked to each other by −CH2− bridges. In this series the acid d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::321f9d2cfcd2e1f00ff1dc74080d500a
https://doi.org/10.1021/ma0015727
https://doi.org/10.1021/ma0015727
Publikováno v:
Angewandte Chemie International Edition in English. 35:2428-2440
This year some twenty billion integrated circuits will be produced worldwide. Almost all (98%) of them will be made with a photosensitive varnish, the photo resist, that allows the transfer of a fine line-pattern from an original transparency onto a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ff49c846af34306959b9231477594e2b
https://doi.org/10.1002/anie.199624281
https://doi.org/10.1002/anie.199624281
Publikováno v:
Angewandte Chemie. 108:2610-2622
Dieses Jahr werden etwa zwanzig Milliarden integrierte Schaltkreise weltweit produziert. Fast alle (98%) werden mit einem photoempfindlichen Lack hergestellt, der die Ubertragung eines feinen Linienmusters von einem Originaltransparent auf einen Sili
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3fb72b6615f7da05ab9af8e4ff4fc26b
https://doi.org/10.1002/ange.19961082105
https://doi.org/10.1002/ange.19961082105
Autor:
Arnost Reiser, Ralph R. Dammel, Hsiao-Yi Shih, Hans J. Merrem, Gerhard Pawlowski, Tung-Feng Yeh
Publikováno v:
Macromolecules. 27:3330-3336
The dissolution of novolak and other phenolic resins in aqueous alkali is controlled by the diffusion of developer base through a thin penetration zone which separates the matrix from the developer solution. Diffusion of base through the zone is a pe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e599b7c7748ce6b927ce28a99543ae18
https://doi.org/10.1021/ma00090a029
https://doi.org/10.1021/ma00090a029
Autor:
Rodney J. Hurditch, Jian Ping Huang, Arnost Reiser, Tung-Feng Yeh, Bernard T. Beauchemin, Kenji Honda
Publikováno v:
Journal of Photopolymer Science and Technology. 7:229-240
Hydrogen bonding between several novolak oligomers as donors and phenylsulfoxide as acceptor was investigated as a model for the interaction of inhibitors with o-o-connected phenolic blocks in practical novolak resins. It was found that the attractio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::12fa1d35431e58f3a7a10df46fa1832e
https://doi.org/10.2494/photopolymer.7.229
https://doi.org/10.2494/photopolymer.7.229
Publikováno v:
Macromolecules. 26:3862-3869
A three-dimensional cubic percolation field is proposed as a model for the behavior of amphiphilic resins in aqueous bases. From the statistics of this model it is found that the percolation parameter is linearly related to the degree of occupation o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc4d3165db3b1ca0549d408b3378241e
https://doi.org/10.1021/ma00067a023
https://doi.org/10.1021/ma00067a023
Publikováno v:
Journal of Photopolymer Science and Technology. 6:147-160
Until quite recently it was believed that dissolution inhibition in phenolic resins is based on a general hydrophobic effect of the inhibitor. Honda et al. [5] have now shown that the hydrophobicity of an additive is not sufficient and that the polar
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7cdb1dd4de0ff39c3686f501c3a064be
https://doi.org/10.2494/photopolymer.6.147
https://doi.org/10.2494/photopolymer.6.147
Publikováno v:
Macromolecules. 25:5345-5352
The dissolution of novolak and other phenolic resins in aqueous alkali is controlled by the diffusion of developer base in the solid matrix. The base penetrates the resin by a series of transfers or jumps from one hydrophilic (phenol/phenolate) site
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dafc439c5b3fc0bf514c583a65c66b85
https://doi.org/10.1021/ma00046a037
https://doi.org/10.1021/ma00046a037
Publikováno v:
Die Makromolekulare Chemie, Rapid Communications. 12:1-4
Les mesures de point de fusion et de temperature de transition vitreuse des melanges du polysiloxane [SiO(Me)R] n R=-(CH 2 ) 3 −C(CF 3 ) 2 OH avec le PEO et avec le PBMA montrent que ces melanges sont miscibles grâce a la formation de liaisons hyd
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::69233394b70ad0fc59af6efcb13e35d3
https://doi.org/10.1002/marc.1991.030120101
https://doi.org/10.1002/marc.1991.030120101