Výsledky vyhledávání - "Tsuzuki, Syuichi"

New filter rating method in practice for sub 30nm lithography process filter

Autor: Numaguchi, Toru, Umada, Toru, Mizuno, Takehito, Tsuzuki, Syuichi

Publikováno v: Proceedings of SPIE, The international Society for Optical Engineering.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=jairo_______::4b2385a7eb5791714bbbf78d0066c048
http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100673302

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Filtration condition study for enhanced microbridge reduction

Autor: Numaguchi, Toru, Umada, Toru, Watanabe, Fumitake, Tsuzuki, Syuichi

Publikováno v: Proceedings of SPIE, The international Society for Optical Engineering.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=jairo_______::ff3a27d04f051b4d44170d3daff23ea6
http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100673305

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The first on-site evaluation of a new filter optimized for TARC and developer

Autor: Numaguchi, Toru, Umada, Toru, Tsuzuki, Syuichi

Publikováno v: Proceedings of SPIE, The international Society of Optical Engineering.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=jairo_______::9d11a00c5ebce1f05e94c9eee30aaf8f
http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100673308

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Defect reduction using POU filtration in a new coater/developer

Autor: Numaguchi, Toru, Umada, Toru, Tsuzuki, Syuichi

Publikováno v: Solid. State Technology. 52(no. 12):19

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=jairo_______::565626c901dcb2671cb92e0b4aed3777
http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100672693

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A novel filter rating method for less than 30nm particles

Autor: Numaguchi, Toru, Mizuno, Takehito, Namiki, Akihisa, Tsuzuki, Syuichi

Publikováno v: IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings. :361

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=jairo_______::95d76564c78a48c44dccf7fd0b212197
http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100673311

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Start up optimization for point of use filter in lithography process

Autor: Numaguchi, Toru, Umada, Toru, Tsuzuki, Syuichi

Publikováno v: IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings. :497

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=jairo_______::ae13fb7182d255ebf9bd7fffd282cd40
http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100673314

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