Zobrazeno 1 - 10
of 49
pro vyhledávání: '"Tsutomu Tsukada"'
Autor:
Tsutomu Tsukada
Publikováno v:
Studia Religiosa Rossica: Russian Journal of Religion. :68-87
The article describes an expedition to the Old Believer communities located in the states of Paraná and Mato Grosso of Brazil (January-February 2013). The route of the trip is described, information is given about the history of the migration of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7a634373132540760a495ddec30fa3bb
https://doi.org/10.28995/2658-4158-2021-3-68-87
https://doi.org/10.28995/2658-4158-2021-3-68-87
Publikováno v:
Journal of equine science
A total of 88 thoroughbred mares were diagnosed with clinical ovarian quiescence and subjected to four treatment regimens. Using PMSG, hCG or combinations of both. A high dose combination of 5,000IU PMSG with 5,000IU hCG showed significantly higher r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::09dfa6de9231da35b7f74a96ddc94714
http://hdl.handle.net/10659/1799
http://hdl.handle.net/10659/1799
Autor:
Masanori Koyago, Anna Yumiko Kojima, Tsutomu Tsukada, Kunitada Sato, Masaharu Moriyoshi, Yutaka Sawamukai
Publikováno v:
Journal of equine science
The concentrations of androstenedione, estradiol-17β, progesterone and PGF2α contained in the follicular fluid produced by the follicles in collected ovaries of mares that have had estrous phase during the breeding season were measured and analyzed
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d2cbd1b5a29d037e89f118f246b0c228
https://doi.org/10.1294/jes.19.31
https://doi.org/10.1294/jes.19.31
Publikováno v:
Journal of Applied Physics. 88:2263-2267
Parameters of supermagnetron plasma produced by rf (radio frequency) pulse, with 49.6 ms on and 0.4 ms off, were investigated by probe characteristics measured at 10–100 μs after the rf pulse in order to avoid disturbance in the measurement. The p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::77b9b83da0dcf7aa7b0c198b9d7d5488
https://doi.org/10.1063/1.1288700
https://doi.org/10.1063/1.1288700
Autor:
Yuko Mizutani, Masaru Hori, Tsutomu Tsukada, Toshio Goto, Ryohei Yoshida, Seiji Samukawa, Shigeaki Sumiya, Masafumi Ito
Publikováno v:
Journal of Applied Physics. 88:576-581
Microcrystalline silicon thin films were formed on quartz substrates by ultrahigh-frequency (UHF) plasma enhanced chemical vapor deposition from a mixture of silane (SiH4) and hydrogen (H2) gases at low substrate temperatures (Ts). The UHF plasma was
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::28860d7586ef0dda6806f9828ead87fb
https://doi.org/10.1063/1.373698
https://doi.org/10.1063/1.373698
Autor:
Shigeaki Sumiya, Toshio Goto, B. Mebarki, Seiji Samukawa, Tsutomu Tsukada, Masafumi Ito, Masaru Hori, Ryohei Yoshida
Publikováno v:
Materials Letters. 41:16-19
Polycrystalline silicon (poly-Si) thin films with crystalline fraction of nearly 75% and 82% were successfully synthesized at low substrate temperatures of 100 and 300°C, respectively, by using ultra-high-frequency plasma employed silane/hydrogen mi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14f707cb72df9797d49d030fdf219536
https://doi.org/10.1016/s0167-577x(99)00097-x
https://doi.org/10.1016/s0167-577x(99)00097-x
Publikováno v:
Journal of Applied Physics. 86:1208-1212
The distribution of self-bias potential (Vdc) on a powered electrode of a supermagnetron plasma system, where both electrodes are supplied phase-shifted radio frequency (rf) currents, was measured using five electrical probes buried in the electrode.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7186ea5868a65674a83d4597d3bff80
https://doi.org/10.1063/1.370872
https://doi.org/10.1063/1.370872
Autor:
H Sato, Seiji Samukawa, Yukito Nakagawa, Etsuo Wani, Kimiko Mashimo, Tsutomu Tsukada, H. Nogami
Publikováno v:
Thin Solid Films. 341:84-90
Plasma characteristics of a M=0 type helicon wave plasma source and an UHF type plasma source were comparatively studied for the purpose of applying in SiO2 etching processes. Helicon wave and UHF type plasma sources were operated at the excitation f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::94771dad55d4d3cb08fa48df3bb9b5a4
https://doi.org/10.1016/s0040-6090(98)01525-9
https://doi.org/10.1016/s0040-6090(98)01525-9
Autor:
Tsutomu Tsukada
Publikováno v:
SHINKU. 42:968-974
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f86ce5f1f883027bc6402436a01fb933
https://doi.org/10.3131/jvsj.42.968
https://doi.org/10.3131/jvsj.42.968
Autor:
Sunil Wickramanayaka, Yukito Nakagawa, Satoru Iizuka, Yunlong Li, Noriyoshi Sato, Tsutomu Tsukada
Publikováno v:
SHINKU. 41:315-319
The applicability of modified magnetron-type plasma source for SiO2 etching was investigated. The plasma source is comprised of a cylindrical shaped rf electrode with two magnetic rings attached to its outer surface, and an electrically isolated top
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::543511be030dfce71f2779ed98398636
https://doi.org/10.3131/jvsj.41.315
https://doi.org/10.3131/jvsj.41.315