Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Tsutomu Shimayama"'
Autor:
Yosuke Motoyama, Seigou Sakai, Takuma Fujii, Takashi Yamazaki, Kan Shimizu, Tsutomu Shimayama, Koji Tanaka, Takayoshi Kato, Chiaki Kon, Koichi Hashikaki, Yasuhiro Nakano
Publikováno v:
SID Symposium Digest of Technical Papers. 49:613-616
Autor:
Seigou Sakai, Takayoshi Kato, Takuma Fujii, Koji Tanaka, Takashi Yamazaki, Tsutomu Shimayama, Yosuke Motoyama, Yasuhiro Nakano, Koichi Hashikaki, Kan Shimizu, Chiaki Kon
Publikováno v:
Journal of the Society for Information Display. 26:178-186
Autor:
Kunitoshi Tajima, Seiji Samukawa, Shingo Kadomura, Tsutomu Shimayama, Masaki Yoshimaru, Noriaki Matsunaga, Hisashi Yano, Shigeo Yasuhara, T. Sasaki
Publikováno v:
Extended Abstracts of the 2010 International Conference on Solid State Devices and Materials.
Autor:
Shigeo Yasuhara, Shingo Kadomura, Kunitoshi Tajima, Tsutomu Shimayama, Seiji Samukawa, Toru Sasaki, Hisashi Yano, Noriaki Matsunaga, Masaki Yoshimaru
Publikováno v:
2010 IEEE International Interconnect Technology Conference.
We investigated a pulse-time-modulated neutral-beam-enhanced CVD at a low substrate temperature of -70°C with dimethoxy-tetramethyl-disiloxane to form low-k SiOCH film. This method provided an ultimate low-k SiOCH film with a k-value of 1.3, a suffi
Autor:
Shigeo Yasuhara, T. Sasaki, Shingo Kadomura, Masaki Yoshimaru, Noriaki Matsunaga, Hisashi Yano, Tsutomu Shimayama, Kunitoshi Tajima, Seiji Samukawa
Publikováno v:
Extended Abstracts of the 2009 International Conference on Solid State Devices and Materials.
Autor:
Shingo Kadomura, Hisashi Yano, Shigeo Yasuhara, Noriaki Matsunaga, Masaki Yoshimaru, Tsutomu Shimayama, Toru Sasaki, Seiji Samukawa, Kunitoshi Tajima
Publikováno v:
Journal of Physics D: Applied Physics. 43:065203
We developed a neutral-beam-enhanced method of chemical vapour deposition (NBECVD) to obtain a lower dielectric constant for the SiOCH interlayer dielectric film while maintaining a reasonable modulus. We achieved a higher deposition rate than that w