Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Tsuneari Fukada"'
Lithography tool improvement at productivity and performance with data analysis and machine learning
Publikováno v:
Photomask Technology 2021.
Semiconductor manufacturing equipment must maintain high productivity and provide high-yield processing and Canon has developing high-reliability exposure tools that have demonstrated high-uptime and performance stability in production. As global eme
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b5c7355db3aa972e6e4966b3aba3b03e
https://doi.org/10.1117/12.2597215
https://doi.org/10.1117/12.2597215
Lithography tool improvement at productivity and performance with data analysis and machine learning
Autor:
Yosuke TAKARADA, Douglas Shelton, Tsuneari Fukada, Shosi Katayama, Ken-Ichiro Mori, Seiya Miura
Publikováno v:
Optical Microlithography XXXIV.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::78d85f85eaccc53387acdc1061a0787b
https://doi.org/10.1117/12.2583784
https://doi.org/10.1117/12.2583784
Publikováno v:
2019 China Semiconductor Technology International Conference (CSTIC).
Minimization of downtime is an important requirement for maximizing customer profits in electronic device manufacturing, in addition to increased superposition accuracy and resolution performance, as well as increased processing speed.This paper repo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::45726ce09812ca00bea885c0672ffee3
https://doi.org/10.1109/cstic.2019.8755755
https://doi.org/10.1109/cstic.2019.8755755