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pro vyhledávání: '"Tsugumi Nagano"'
Autor:
Mochihiro Shimizu, Hidekazu Migita, Hiroyuki Ishii, Hiroyuki Iwashita, Masahiro Hashimoto, Masao Ushida, Toshiyuki Suzuki, Morio Hosoya, Hideaki Mitsui, Yasushi Ohkubo, Tsugumi Nagano, Ryugo Hikichi, Noriko Kakehi, Hideyoshi Takamizawa
Publikováno v:
SPIE Proceedings.
193nm-immersion lithography is the most promising technology for 32nm-node device fabrication. At the 32nm technology-node, the performance of photomasks, not only phase-shift masks but also binary masks, needs to be improved, especially in "resoluti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fecda67f10a80cbf3539e23b07c6e8ed
https://doi.org/10.1117/12.793014
https://doi.org/10.1117/12.793014
