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pro vyhledávání: '"Tsohifumi Suganaga"'
Autor:
Tomoyuki Ando, Tetsuro Hanawa, Mamoru Terai, Takeo Ishibashi, Teruhiko Kumada, Kazuyuki Suko, Shinroku Maejima, Koichiro Narimatsu, Tsohifumi Suganaga
Publikováno v:
Journal of Photopolymer Science and Technology. 19:547-554
This paper is intended as investigations of two interesting characteristics of ArF immersion lithography using topcoat (TC). On the one hand, we identified several hundreds gel-type defects over large areas of the unexposed top surface of the resist
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9eebf7dd4d2fb5895a3519a8524b8a2b
https://doi.org/10.2494/photopolymer.19.547
https://doi.org/10.2494/photopolymer.19.547
