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pro vyhledávání: '"Tse-Yu Chiang"'
Autor:
Tse-Yu Chiang, 江則佑
96
At the present days, the key and critical part of industrial IC manufacture is the optical lithography technology which can duplicate the design patterns on the mask onto wafer by light exposure. However, when the mask patterns are too small
At the present days, the key and critical part of industrial IC manufacture is the optical lithography technology which can duplicate the design patterns on the mask onto wafer by light exposure. However, when the mask patterns are too small
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/17771551777073303525
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2322-2330
Abbe’s method and Hopkin’s method are among the most popular microlithography aerial image simulation methods. In particular, Hopkin’s method is generally more popular for the high speed aerial image simulation domain, and it is used in model-b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9194b48e0e165e9127f204cd44c1fa1a
https://doi.org/10.1116/1.3013310
https://doi.org/10.1116/1.3013310
Autor:
Sanghamitra Roy, Yu Hen Hu, Charlie Chung-Ping Chen, Shih-Pin Hung, Tse-Yu Chiang, Jiuan-Guei Tseng
Publikováno v:
2008 Asia and South Pacific Design Automation Conference.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e389f3797ba5c865891891d00912a67a
https://doi.org/10.1109/aspdac.2008.4483929
https://doi.org/10.1109/aspdac.2008.4483929
Publikováno v:
2008 Asia & South Pacific Design Automation Conference; 2008, p148-151, 4p
Autor:
Chung Ping Chen, Charlie, Gurhanli, Ahmet, Tse-Yu Chiang, Jen-Jer Hong, Melvin III, Lawrence S.
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Nov2008, Vol. 26 Issue 6, p2322-2330, 9p, 1 Black and White Photograph, 5 Diagrams, 2 Charts, 6 Graphs