Advanced x-ray mask inspection system (AXIS) using scanning electron microscopy for sub-70nm die-to-database inspections.

Autor: Boerger, Brent E., Yu, Mengchen, Selzer, Robert A., Ma, Yungsheng, Ronning, Donald, Ducharme, Donald, Grenon, Brian J., Trybendis, Michael J.

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Next-generation lithography mask development at the NGL Mask Center of Competency.

Autor: Lercel, Michael J., Brooks, Cameron J., Racette, Kenneth C., Magg, Christopher, Lawliss, Mark, Caldwell, Neal, Jeffer, Raymond, Collins, Kevin W., Barrett, Monica, Nash, Steven C., Trybendis, Michael J., Bouchard, Lucien

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Fabrication of masks for electron-beam projection lithography.

Autor: Lercel, Michael, Magg, Chris, Barrett, Monica, Collins, Kevin, Trybendis, Michael, Caldwell, Neal, Jeffer, Ray, Bouchard, Lucien

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