Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Troy B. Morrison"'
Publikováno v:
SPIE Proceedings.
As advanced photolithography extends the ability to print feature sizes below the 100 nm technology node, various reticle enhancement techniques (RET) are being employed to improve resolution. An example of RET is the alternating phase shift mask (AP
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::158706880825fb973ea29d8751900702
https://doi.org/10.1117/12.504211
https://doi.org/10.1117/12.504211
Autor:
Norbert Falk, Guenther Ruhl, Troy B. Morrison, Ralf Dietrich, Brigitte C. Stoehr, Ralf Ludwig
Publikováno v:
SPIE Proceedings.
In this paper we describe the development of a chrome dry etch process on a new type of mask etch tool. One crucial goal was to minimize the CD etch bias. To meet this goal, a procedure for the direct characterization of CD etch bias was developed. T
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::20633409710fe5c953bdff1a8724ea8e
https://doi.org/10.1117/12.410753
https://doi.org/10.1117/12.410753