Zobrazeno 1 - 10
of 57
pro vyhledávání: '"Trouiller, Yorick"'
Autor:
Gardin, Christian, Belledent, Jérôme, Trouiller, Yorick, Borjon, Amandine, Couderc, Christophe, Foussadier, Franck, Yesilada, Emek, Urbani, Jean-Christophe, Sundermann, Frank, Rody, Yves, Saied, Mazen, Planchot, Jonathan, Robert, Frederic
Publikováno v:
In Microelectronic Engineering 2007 84(5):770-773
Autor:
Borjon, Amandine, Belledent, Jérôme, Trouiller, Yorick, Gardin, Christian, Couderc, Christophe, Rody, Yves, Sundermann, Frank, Urbani, Jean-Christophe, Foussadier, Franck, Planchot, Jonathan, Yesilada, Emek, Montgomery, Patrick, Willkinson, Bill, Saied, Mazen, Martinelli, Catherine, Kerrien, Gurwan, Cam, Laurent Le, Vautrin, Florent, Robert, Frédéric, Schiavone, Patrick
Publikováno v:
In Microelectronic Engineering 2007 84(5):741-745
Autor:
Borjon, Amandine, Belledent, Jérôme, Trouiller, Yorick, Patterson, Kyle, Lucas, Kevin, Gardin, Christian, Couderc, Christophe, Rody, Yves, Sundermann, Frank, Urbani, Jean-Christophe, Baron, Stanislas, Foussadier, Frank, Schiavone, Patrick
Publikováno v:
In Microelectronic Engineering 2006 83(4):1017-1022
Publikováno v:
Proceedings of SPIE
Metrology, Inspection, and Process Control for Microlithography XXIV
Metrology, Inspection, and Process Control for Microlithography XXIV, Feb 2010, San Jose (CA), United States. in press
Metrology, Inspection, and Process Control for Microlithography XXIV
Metrology, Inspection, and Process Control for Microlithography XXIV, Feb 2010, San Jose (CA), United States. in press
International audience; Mask and metrology errors such as SEM (Scanning Electron Microscopy) measurement errors are currently not accounted for when calibrating OPC models. Nevertheless, they can lead to erroneous model parameters therefore causing i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::00c02e7a0c629b4b3ba7a7b7f726ab9e
https://hal.archives-ouvertes.fr/hal-00462229/document
https://hal.archives-ouvertes.fr/hal-00462229/document
Autor:
Borjon, Amandine, Belledent, Jerôme, Trouiller, Yorick, Patterson, Kyle, Lucas, Kevin, Couderc, Christophe, Sundermann, Frank, Urbani, Jean-Christophe, Baron, Stanislas, Rody, Yves, Gardin, Christian, Foussadier, Frank, Schiavone, Patrick
Publikováno v:
Proc. SPIE vol. 5992, 25th Annual BACUS Symposium on Photomask Technology
Ensuring robust patterning after OPC is becoming more and more difficult due to the continuous reduction of layout dimensions and diminishing process windows associated with each successive lithographic generation. Lithographers must guarantee high i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::aa5eb6e1d351fbca04f3803c3d71546c
https://hal.archives-ouvertes.fr/hal-00023227
https://hal.archives-ouvertes.fr/hal-00023227
Autor:
Allouti, Nacima, Chausse, Pascal, Aumont, Christophe, Issele, Helene, Vignoud, Lionel, Rochat, Nevine, Poulain, Christophe, Gasiglia, Magalie, Sourd, Claire, Argoud, Maxime, Coudrain, Perceval, Trouiller, Yorick
Publikováno v:
2013 IEEE 15th Electronics Packaging Technology Conference (EPTC 2013); 2013, p27-32, 6p
Autor:
Top, Mame Kouna, Trouiller, Yorick, Farys, Vincent, Fuard, David, Yesilada, Emek, Martinelli, Catherine, Said, Mazen, Foussadier, Franck, Schiavone, Patrick
Publikováno v:
Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72721G-72721G-8, 8p
Autor:
Foussadier, Franck, Yesilada, Emek, Le Denmat, Jean-Christophe, Trouiller, Yorick, Farys, Vincent, Robert, Frédéric, Kerrien, Gurwan, Gardin, Christian, Perraud, Loic, Vautrin, Florent, Villaret, Alexandre, Martinelli, Catherine, Planchot, Jonathan, Di-Maria, Jean Luc, Saied, Mazen, Top, Mame Kouna
Publikováno v:
Proceedings of SPIE; Nov2009, Issue 1, p727416-727416-7, 7p
Autor:
Bingert, Raphael, Aurand, Alain, Marin, Jean-Claude, Balossier, Eric, Devoivre, Thierry, Trouiller, Yorick, Vautrin, Florent, Verghese, Nishath, Rouse, Richard, Cote, Michel, Hurat, Philippe
Publikováno v:
Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69250M-69250M-12, 12p
Autor:
Trouiller, Yorick, Farys, Vincent, Borjon, Amandine, Belledent, Jérôme, Couderc, Christophe, Sundermann, Frank, Urbani, Jean-Christophe, Rody, Yves, Gardin, Christian, Planchot, Jonathan, Conley, Will, Goirand, Pierre-Jerome, Warrick, Scott, Robert, Frédéric, Kerrien, Gurwan, Vautrin, Florent, Wilkinson, Bill, Saied, Mazen, Yesilada, Emic, Montgomery, Patrick
Publikováno v:
Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65201D-65201D-12, 12p