Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Trevor Hoskins"'
Autor:
Larry Seger, Robert A. Shick, Ankur Agrawal, Larry F. Rhodes, Trevor Hoskins, Peter J. Ludovice, Won J. Chung, Clifford L. Henderson
Publikováno v:
Macromolecules. 37:4512-4518
Alicyclic polymers, such as substituted polynorbornene (PNB), are expected to be one potential material solution for providing transparent photoresist polymer resins for photolithography at 193 and 157 nm wavelengths. In this work, the dissolution be
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aeb2321329dfbba71cf5dfda99969657
https://doi.org/10.1021/ma0347417
https://doi.org/10.1021/ma0347417
Autor:
Trevor Hoskins
Publikováno v:
Journal of Medical Biography. 11:14-20
The composer Constant Lambert suffered a near fatal attack of septicaemia while he was at school at Christ's Hospital in 1916. His survival owed no small part to the school medical officer, Gerald Friend, himself renowned for his work on nutrition an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::21464d9251e0f08adbf46148762b6874
https://doi.org/10.1177/096777200301100106
https://doi.org/10.1177/096777200301100106
Autor:
Trevor Hoskins
Publikováno v:
International journal of adolescent medicine and health. 4(2)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::65b9e1b679dd9bbcf09eaaa5ad95eec1
https://pubmed.ncbi.nlm.nih.gov/22912088
https://pubmed.ncbi.nlm.nih.gov/22912088
Autor:
Trevor Hoskins
Publikováno v:
Journal of medical biography. 16(1)
Summary Herbert Aldersmith spent his entire working life, from the age of 23 years until his retirement at 65 years, as Resident Medical Officer to Christ's Hospital School. It was a crucial period in the school's history, from the overdue reforms of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d254345f2ff992af1bcf64af3ff7ce27
https://pubmed.ncbi.nlm.nih.gov/18463063
https://pubmed.ncbi.nlm.nih.gov/18463063
Publikováno v:
SPIE Proceedings.
As 193 nm immersion lithography continues to evolve, the need to understand the effect of the immersing liquid on the resulting photoresist properties continues to grow. With this in mind, the sorption of water (using both liquid and vapor environmen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a7efcf09c552c5d69ea535ae36b6247b
https://doi.org/10.1117/12.607434
https://doi.org/10.1117/12.607434
Autor:
Clifford L. Henderson, Larry Seger, Cody M. Berger, Chun Chang, Larry F. Rhodes, Peter J. Ludovice, Trevor Hoskins
Publikováno v:
SPIE Proceedings.
Alicyclic polymers, such as substituted polynorbornenes, are one potential material solution for providing photoresist polymer resins with high transparency backbones for photolithography at 193 nm and 157 nm wavelengths. In addition, the bis-trifluo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2b38962419b376adf30635fcd430672b
https://doi.org/10.1117/12.536264
https://doi.org/10.1117/12.536264
Autor:
Trevor Hoskins, Won J. Chung, Robert A. Shick, Clifford L. Henderson, Larry F. Rhodes, Peter J. Ludovice, Larry Seger
Publikováno v:
Advances in Resist Technology and Processing XX.
As features shrink below 100 nm, new exposure technologies such as 157 nm lithography are being developed. One of the critical challenges in developing these new lithographic tools and processes is the development of appropriate resist materials that
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8d4b09fa33f89f239db0326aae084925
https://doi.org/10.1117/12.485145
https://doi.org/10.1117/12.485145