Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Trevan Landin"'
Publikováno v:
International Symposium for Testing and Failure Analysis.
Complex failure analysis often requires the use of multiple characterization instruments. For example, a defect or failure may be localized using one tool, whereas the subsequent marking, precision targeting, and high-resolution analysis may require
Publikováno v:
International Symposium for Testing and Failure Analysis.
An advanced technique for site-specific Atom Probe Tomography (APT) is presented. An APT sample is prepared from a targeted semiconductor device (commercially available product based on 14nm finFET technology). Using orthogonal views of the sample in
Autor:
Lisa McGill, Stephen M. Seddio, Chris Stephens, Roger L. Alvis, Jake Jensen, Zdenek Kral, Trevan Landin
Publikováno v:
International Symposium for Testing and Failure Analysis.
The potential benefits and challenges of low kV SEM imaging and EDS elemental analysis have been discussed in the SEM community since at least the early 1990s [1,2]. Concurrent with steady progress in the performance of so-called extreme high-resolut
Autor:
Trevan Landin, Zdenek Kral
Publikováno v:
2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA).
An advanced sample preparation technique is demonstrated on a 3D Fin-FET structure. We present a step-by-step workflow to localize/mark a target structure (defect) in the horizontal plane of the sample and convert it into a vertical cross-section lam
Plasma FIB DualBeam Delayering for Atomic Force NanoProbing of 14 nm FinFET Devices in an SRAM Array
Autor:
Sean Zumwalt, Trevan Landin, Shih-Hsin Chang, Roger Alvis, Andrew Norman Erickson, Sinjin Dixon-Warren, Chia-Hsiang Yen, Chih-Hsun Chu, Wan-Yi Liu, Pau-Sheng Kuo, Te-Fu Chang, Peter Carleson, Oleg Sidorov, Chad Rue
Publikováno v:
International Symposium for Testing and Failure Analysis.
The result of applying normal xenon ion beam milling combined with patented DX chemistry to delayer state-of-theart commercial-grade 14nm finFETs has been demonstrated in a Helios Plasma FIB DualBeam™. AFM, Conductive-AFM and nano-probing with the
Autor:
Paul Brabant, Trevan Landin, M. Rittgers, Y. Zhang, Keith Doran Weeks, B. Pagliaro, J. Spear, Joe P. Italiano, J. Ferrara, Shawn G. Thomas, R. Scott, T. Irving
Publikováno v:
Applied Surface Science. 255:1741-1743
We investigated the oxidation of hydrogen terminated Si (1 0 0) surfaces stored in Fab air environment. Hydrogen termination for extended queue times with wet and dry clean techniques is investigated. Comparison of X-ray photoelectron spectroscopy (X
Publikováno v:
Applied Surface Science. 224:347-349
Studies of low frequency 1/ f noise show that the key to reduce 1/ f noise is to reduce/eliminate interfacial oxides at the base–emitter interface. It was reported that an epitaxial silicon emitter has led to record 1/ f noise performance due to th
Publikováno v:
ACS nano. 6(10)
Surfaces with special wetting properties not only can efficiently repel or attract liquids such as water and oils but also can prevent formation of biofilms, ice, and clathrate hydrates. Predicting the wetting properties of these special surfaces req
Autor:
Peter Carleson, Michael DiBattista, Trevan Landin, Michael A. Gonzales, Roddy Cruz, Bryan Routh, Ebb Huggins, Jonathan Lau, Kenny Mani, Martin E. Parley
Publikováno v:
2012 19th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits.
Packaging technology plays a key role in the performance of many analog and RF circuits. Due to the size and geometries of interconnects, FIB based circuit edit has not been practical on the package. Plasma FIB (PFIB) technology allows cuts and rewir
Publikováno v:
Microscopy and Microanalysis. 20:2000-2001