Electron-beam lithography for advanced device prototyping: Process tool metrology.

Autor: Rosenfield, M. G., Thomson, M. G. R., Coane, P. J., Kwietniak, K. T., Keller, J., Klaus, D. P., Volant, R. P., Blair, C. R., Tremaine, K. S., Newman, T. H., Hohn, F. J.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1993, Vol. 11 Issue 6, p2615-2620, 6p