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pro vyhledávání: '"Transfert des motifs"'
Autor:
Gusmao Cacho, Maria
Publikováno v:
Micro and nanotechnologies/Microelectronics. Université Grenoble Alpes [2020-..], 2021. English. ⟨NNT : 2021GRALT056⟩
For the sub-10 nm technologic nodes, conventional lithography has achieved its limit in terms of pattern scaling and new patterning techniques are being studied to continue the miniaturization of the transistor’s dimensions. In this PhD, we have fo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::d15cc5d9d09c32a5632fbf34bdb6530e
https://theses.hal.science/tel-03524057
https://theses.hal.science/tel-03524057
