Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Touati, Ferid"'
Autor:
Touati Ferid, Manabu Saji
Publikováno v:
Journal of Crystal Growth. 172:83-88
Hall measurements have been performed on gallium-doped n-type CdTe metalorganic vapor phase epitaxy layers between 25 and 300 K. The Hall coefficient and mobility data could be better explained assuming a singly ionized donor model. The ionization en
Publikováno v:
Journal of Electronic Materials. 24:1093-1097
Growth characteristics of (100) HgCdTe (MCT) layers by MOVPE at low temperature of 275°C were studied using ditertiarybutyltelluride as a tellurium precursor. Growths were conducted in a vertical narrow-spacing growth cell at atmospheric pressure. C
Publikováno v:
Journal of Crystal Growth. 128:613-616
Correlations of surface morphology with the growth characteristics and optimal doping conditions of (100) CdTe layers grown by metalorganic vapor phase epitaxy have been studied. Growths were carried out on (100) GaAs substrates using diethyltelluriu
Publikováno v:
Journal of Applied Physics. 72:3406-3409
Electronic properties in Ga‐doped (100) CdTe layers on (100) GaAs grown by atmospheric pressure metalorganic vapor phase epitaxy were studied. Triethylgallium was used as a dopant source. The source materials were dimethylcadmium (DMCd) and diethyl
Publikováno v:
JOURNAL OF APPLIED PHYSICS. 71(6):2669-2674
The As doping mechanism in (100) CdTe layers grown on (100)GaAs by atmospheric‐pressure metalorganic vapor phase epitaxy was studied. Triethylarsine (TEAs) was used as a dopant source. The source materials used were dimethylcadmium (DMCd) and dieth
Publikováno v:
Journal of Crystal Growth. 117:254-258
The mechanism of As incorporation in CdTe layers grown by atmospheric-pressure metalorganic vapor phase epitaxy (MOVPE) is reported. Triethylarsine (TEAs) was used as a dopant source. The As incorporation decreased with the DETe flow rate under a fix
Autor:
Touati, Ferid, Takemasa, Kiminori
Publikováno v:
IEEE Transactions on Electron Devices. Mar99, Vol. 46 Issue 3, p444. 5p. 3 Black and White Photographs, 1 Chart, 8 Graphs.
Autor:
Touati Ferid, Masaya Minamide, Kazuhito Yasuda, Hiroki Hatano, Kazuhiro Kawamoto, Takayuki Maejima
Publikováno v:
Japanese Journal of Applied Physics. 33:6481
Electrical properties of Hg1- x Cd x Te layers grown by low-temperature metalorganic vapor phase epitaxy at 275°C have been studied. Substrates used were (100) GaAs. The precursors used were dimethylcadmium (DMCd), elemental mercury, and ditertiaryb
Publikováno v:
Journal of Electronic Materials; Mar1999, Vol. 28 Issue 3, p186-189, 4p
Growth characteristics of (100) HgCdTe layers in low-temperature MOVPE with ditertiarybutyltelluride
Publikováno v:
Scopus-Elsevier
Low-temperature growth of (100)HgCdTe (MCT) layers in MOVPE has been studied using ditertiarybutyltelluride (DtBTe), dimethylcadmium (DMCd), and elementary mercury as precursors. MCT layers were grown at 275°C on (100)GaAs substrates. Growths were c
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http://www.scopus.com/inward/record.url?eid=2-s2.0-0030230786&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-0030230786&partnerID=MN8TOARS