Zobrazeno 1 - 10 of 36 pro vyhledávání: '"Toshio Sakamizu"'
1
Supercritical-Carbon-Dioxide Solubility Characteristics of Polyphenols and Polyphenol Derivatives
Autor: Hiro Yamamoto, Hiroshi Shiraishi, Toshio Sakamizu
Publikováno v: Journal of Photopolymer Science and Technology. 19:367-372
Supercritical carbon dioxide (scCO2) solubility characteristics of various polyphenols and their derivatives were investigated for the sake of resist materials for scCO2 development. Some 3 nuclei-polyphenols were fairly soluble in scCO2 at the condi
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::abacf9f4f443eb1d3057d71b4b5e6a55
https://doi.org/10.2494/photopolymer.19.367
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2
Electron-beam nanolithography and line-edge roughness of acid-breakable resin-based positive resist
Autor: Hiroshi Shiraishi, Toshio Sakamizu
Publikováno v: Microelectronic Engineering. :763-770
A positive chemical amplification resist based on acid-catalyzed fragmentation of the acetal groups in the polymer main-chain has been developed for electron-beam (EB) nanolithography. This resist consists of an acid generator, an acid-diffusion cont
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5833ff40791e26d0f7fc4d85a4d819cd
https://doi.org/10.1016/s0167-9317(02)00453-7
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3
Fundamental Studies of Acid-Breakable Resins for Chemical-Amplification Positive Resist Matrices
Autor: Toshio Sakamizu, Kei Kasuya, Hiroshi Shiraishi, Michiaki Hashimoto, Tadashi Arai, Sonoko Migitaka
Publikováno v: Journal of Photopolymer Science and Technology. 14:523-530
We have investigated acid-breakable (AB) resins for chemical-amplification positive resists. The AB resin was synthesized by a co-condensation reaction between an alkali-soluble polyphenol (4, 4′-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]-eth
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c2eb085f68ddf344717101d2fa2ea224
https://doi.org/10.2494/photopolymer.14.523
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5
Structural Design of Resin Matrix and Acid-labile Dissolution Inhibitor of Chemical Amplification Positive Electron-beam Resist for Gigabit Lithography
Autor: Toshio Sakamizu, Tadasi Arai, Yasunori Suzuki, Kohji Katoh, Shou-ichi Uchino, Fumio Murai, Hiroshi Shiraishi
Publikováno v: Journal of Photopolymer Science and Technology. 11:547-552
The effect of m/p-cresol novolak molecular-weight-distribution (MWD) and dissolution inhibitor structure on resist performance were investigated. A novolak resin richer in p-cresol ratio gave a large dissolution inhibition capability of polymeric dis
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b53ded3dfe13530b8c2f05d1fc3ac660
https://doi.org/10.2494/photopolymer.11.547
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8
Development of single-layer positive resist process for electron beam direct writing technology
Autor: Toshio Sakamizu, Keiko Hasegawa, Shinji Okazaki, Hajime Hayakawa, Hiroshi Shiraishi, Fumio Murai, Hidenori Yamaguchi
Publikováno v: Electronics and Communications in Japan (Part II: Electronics). 78:81-91
A single-layer resist process using a high resistivity positive resist by solubility reversal (PSR) for electron beam direct writing is described. Conventional PSR designed for mask creation is found to have inhomogeneous dissolution characteristics
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::de8017af3f320431d96be1171b75aca6
https://doi.org/10.1002/ecjb.4420780809
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9
Development of positive electron-beam chemical amplification resists using tetrahydropyranyl-protected polyvinylphenol
Autor: Kohji Katoh, Michiaki Hashimoto, Hiroshi Shiraishi, Takumi Ueno, Toshio Sakamizu
Publikováno v: Journal of Photopolymer Science and Technology. 8:21-28
Chemical amplification positive resists using tetrahydropyranyl-protected polyvinylphenol (THP-M) were investigated for electron-beam lithography. To enhance the resist performance, we used a new novolak resin and trimethylsulfonium triflate (MES) as
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::93aa130ad7d6ae93477138b673e38906
https://doi.org/10.2494/photopolymer.8.21
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10
Chemical amplification resists for future lithography
Autor: Hiroshi Shiraishi, Takashi Hattori, Takumi Ueno, Toshio Sakamizu, Shou-ichi Uchino
Publikováno v: Journal of Photopolymer Science and Technology. 7:397-405
The technologies for future lithography have been proposed, such as i-line phase-shifting lithography, deep-UV lithography and electron beam lithography. We have proposed several types of chemical amplification resist systems for future lithography.
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e52d954a7a8010782507aa464f08a700
https://doi.org/10.2494/photopolymer.7.397
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