Zobrazeno 1 - 10
of 39
pro vyhledávání: '"Toshio Onodera"'
Publikováno v:
IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences. :782-790
A sweep spectrum analyzer has been improved over the years, but the fundamental method has not been changed before the 'Super Sweep' method appeared. The 'Super Sweep' method has been expected to break the limitation of the conventional sweep spectru
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9a7c7c5f7265ffbaafb5a7abb79d13fe
https://doi.org/10.1093/ietfec/e91-a.3.782
https://doi.org/10.1093/ietfec/e91-a.3.782
Autor:
Takafumi Hoashi, Toshio Onodera
Publikováno v:
The Journal of the Institute of Image Information and Television Engineers. 56:1145-1152
In order to increase the receiving power of the Fresnel-zone plate antenna suitable for the reception of signals from multiple Television-Broadcasting satellites, a reflector-type antenna is developed where an additional reflector plate provided 1/4
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1a4d8112ae0752dc96ad5b23bfa1d050
https://doi.org/10.3169/itej.56.1145
https://doi.org/10.3169/itej.56.1145
Autor:
Takashi Sato, Michio Honma, Hiroyuki Itoh, Nobuyuki Iriki, Sachiko Kobayashi, Norihiko Miyazaki, Toshio Onodera, Hiroyuki Suzuki, Nobuyuki Yoshioka, Sumika Arima, Kazuya Kadota
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cdc08672d2f0547d9186691f019bda2e
https://doi.org/10.1117/12.824354
https://doi.org/10.1117/12.824354
Autor:
Toshio Onodera, Hiroshi Ieki
Publikováno v:
Electronics and Communications in Japan (Part II: Electronics). 73:66-70
The phase velocity of a T-rod-type dielectric loaded helix is determined by the developed helix method. Further, the phase velocity and coupling impedance are measured and circuit characteristics of the loaded helix are clarified.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ca7d254fcf3b2fd8bb635cefe2d106f5
https://doi.org/10.1002/ecjb.4420730808
https://doi.org/10.1002/ecjb.4420730808
Autor:
Tai Sato, Norihiko Miyazaki, K. Kadota, M. Honma, Nobuyuki Yoshioka, H. Itoh, K. Hosono, N. Iriki, Toshio Onodera, T. Uga, H. Suzuki
Publikováno v:
SPIE Proceedings.
Design For Manufacturability Production Management (DFM-PM) Subcommittee has been started in succession to Reticle Management Subcommittee (RMS) in Semiconductor Manufacturing Technology Committee for Japan (SMTCJ) from 2005. Our activity focuses on
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::db351d690b26ee1620ea9a61430de4ef
https://doi.org/10.1117/12.681729
https://doi.org/10.1117/12.681729
Autor:
Masaki Mori, Tadashi Imoriya, Iwao Higashikawa, N. Iriki, Toshio Onodera, M. Homma, Tai Sato, T. Matsuda, Norihiko Miyazaki, Hidehiro Higashino, Nobuyuki Yoshioka, K. Okuda
Publikováno v:
SPIE Proceedings.
We reported the Guideline(Ver. 1) of Reticle Data Management(RDM) Activity in 2001. Among we have been focused SoC(System on Chip) Business, we have been improved the efficiency over Design technology, Mask manufacturing and Wafer manufacturing. Espe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::261895852794ea3a4a69414ddc646fcc
https://doi.org/10.1117/12.557741
https://doi.org/10.1117/12.557741
Autor:
M. Homma, T. Matsuda, Iwao Higashikawa, Norihiko Miyazaki, Hidehiro Higashino, Nobuyuki Yoshioka, Nobuyuki Iriki, Tai Sato, Toshio Onodera, T. Uga
Publikováno v:
SPIE Proceedings.
We reported the Guideline (Ver.1) of Reticle Data Management (RDM) Activity in 2001. While focusing on SoC (System on Chip) business, we have improved the efficiency in design technology, mask manufacturing and wafer manufacturing. Especially, these
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::efec3d9859657e61d7e1b879fb4053d9
https://doi.org/10.1117/12.568028
https://doi.org/10.1117/12.568028
Publikováno v:
SPIE Proceedings.
We developed a new focus monitoring method that is simple yet highly accurate. We used simple measurement tools: a conventional binary mask and an optical overlay inspection machine. Our method was sufficiently precise to detect sub-100nm focus error
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::da30f0c572e0145c7bcd46185e9224a2
https://doi.org/10.1117/12.485353
https://doi.org/10.1117/12.485353
Autor:
Iwao Higashikawa, K. Okuda, M. Mori, Nobuyuki Yoshioka, Tai Sato, T. Matsuda, M. Homma, Toshio Onodera, N. Iriki, Tadashi Imoriya, Norihiko Miyazaki, Hidehiro Higashino
Publikováno v:
SPIE Proceedings.
We reported the Guideline(Ver.1) of Reticle Data Management (RDM) Activity in 2001. Among we have been focused SoC(System on Chip) Business, we have been improved the efficiency over Design technology, Mask manufacturing and Wafer manufacturing. Espe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a69e3d5a9d3dc6b89c264a339a4339c
https://doi.org/10.1117/12.484438
https://doi.org/10.1117/12.484438
Publikováno v:
SPIE Proceedings.
This work was done to identify viable materials for attenuated phase-shift masks (Att-PSMs) for use with 157-nm lithography. Earlier studies proposed Si-based and Zr-based materials as potential contenders for use as Att-PSMs for 157-nm lithography.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e69b89b8886c654806e28f2f24e7013d
https://doi.org/10.1117/12.435642
https://doi.org/10.1117/12.435642