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pro vyhledávání: '"Toshinobu Furusho"'
Autor:
Takahiro Okubo, Kouzo Nishi, Koji Takayanagi, Toshinobu Furusho, Kosuke Yoshihara, Tsuyoshi Shibata, Yusuke Yamamoto
Publikováno v:
SPIE Proceedings.
As pattern size becomes smaller, requirement for defect reduction is getting higher and higher. It is known that defects occur in various steps of lithography process. In this study, we focus on defects related to the resist dispense system. Of those
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1e0d7a814471d2633623b89c17af04c4
https://doi.org/10.1117/12.879339
https://doi.org/10.1117/12.879339
