Zobrazeno 1 - 10
of 21
pro vyhledávání: '"Toshikage Asakura"'
Autor:
Ryuichi Takahashi, Tamaki Nakano, Hisatoshi Kura, Keita Tanaka, Hitoshi Yamato, Toshikage Asakura
Publikováno v:
Journal of Photopolymer Science and Technology. 27:227-230
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::766ade656c7202e3ee76af899b4ee782
https://doi.org/10.2494/photopolymer.27.227
https://doi.org/10.2494/photopolymer.27.227
Publikováno v:
Journal of Photopolymer Science and Technology. 22:89-95
Extreme Ultraviolet (EUV) has already achieved the initial requirements for 32 nm DRAM half pitch lithography rule and is known as one of the most promising next generation lithography techniques to be realized for 22 nm patterning technology though
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::159afd887dd871938cb9a86e12b3d2bd
https://doi.org/10.2494/photopolymer.22.89
https://doi.org/10.2494/photopolymer.22.89
Publikováno v:
Journal of Photopolymer Science and Technology. 21:377-381
So far, we have developed and reported a series of novel oxime sulfonate type of photoacid generators (PAG) composed of a fluorenyl chromophore like 2-[2,2,3,3,4,4,5,5-octafluoro-1-(nonafluorobutylsulfonyloxyimino)-pentyl]-fluorene (ONPF), which gene
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::730f748c552e1a2b1f1959b3d9627210
https://doi.org/10.2494/photopolymer.21.377
https://doi.org/10.2494/photopolymer.21.377
Autor:
Akira Matsumoto, Yuichi Nishimae, Tobias Hinterman, Junichi Tanabe, Jean-Luc Birbaum, Masaki Ohwa, Toshikage Asakura, Peter Murer, Hitoshi Yamamoto
Publikováno v:
Journal of Photopolymer Science and Technology. 20:637-642
Oxime sulfonate compounds are one of the important chemistry as photoacid generator for advanced lithography application and practically used in mass production of semiconductor chips. This chemistry is adjustable for various applications like g-/h-/
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::15116cbedd30faee0d989dd8295272aa
https://doi.org/10.2494/photopolymer.20.637
https://doi.org/10.2494/photopolymer.20.637
Publikováno v:
Journal of Photopolymer Science and Technology. 20:465-471
Recently we have developed and reported some novel non-ionic photoacid generators (PAGs) which generate a strong acid (perfluorobutanesulfonic acid) by light irradiation and is applicable to chemically amplified ArF photoresist, such as 2-[2,2,3,3,4,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b14b9c77718f2445559dad423311289
https://doi.org/10.2494/photopolymer.20.465
https://doi.org/10.2494/photopolymer.20.465
Publikováno v:
Journal of Photopolymer Science and Technology. 19:335-342
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::761c80ff0315c48a6741af502fa60365
https://doi.org/10.2494/photopolymer.19.335
https://doi.org/10.2494/photopolymer.19.335
Publikováno v:
Journal of Photopolymer Science and Technology. 16:335-345
Recently we have developed new class of non-ionic oxime sulfonate PAG. The compounds generate various kinds of sulfonic acids, such as n-propane, n-octane, camphor and p-toluene sulfonic acid under Deep-UV exposure and trifluoromethanesulfonic acid u
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ee747b033d7baca8b8a631128d6f5222
https://doi.org/10.2494/photopolymer.16.335
https://doi.org/10.2494/photopolymer.16.335
Publikováno v:
Journal of Photopolymer Science and Technology. 13:223-230
A new class of compounds which are non-ionic and halogen-free photo acid generators applicable for g-line, i-line and DUV photoresists is reported. The compounds exhibit high solubility in PGMEA, thermal stability in a phenolic polymer matrix up to 1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8aad3b94b0d2e5d67fca1f84d7c737bc
https://doi.org/10.2494/photopolymer.13.223
https://doi.org/10.2494/photopolymer.13.223
Autor:
Hitoshi Yamato, Kenichiro Kai, Takafumi Koshiba, Masaki Ohwa, Toshikage Asakura, Wolfgang Wernet
Publikováno v:
Synthetic Metals. 83:125-130
Electrochemical polymerization of 3,4-ethylenedioxythiophene (EDT) was carried out in the presence of monomeric anions or polyanions in electrolyte solutions. While no free-standing films of poly (3,4-ethylenedioxythiophene) (PEDT) were obtained usin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9d1fe6fa4a5ef77966403409c80e56a9
https://doi.org/10.1016/s0379-6779(97)80065-3
https://doi.org/10.1016/s0379-6779(97)80065-3
Publikováno v:
Chemistry Letters. 20:1105-1108
Two methacrylates with a biphenyl moiety as a mesogenic group were anionically polymerized with t-butylmagnesium bromide in toluene, chloroform, and tetrahydrofuran at low temperature. Differential scanning calorimetric analysis of the highly isotact
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8dc07f2d777e9244b9fefeed7cecd9b7
https://doi.org/10.1246/cl.1991.1105
https://doi.org/10.1246/cl.1991.1105