Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Toshihiro Nishisaka"'
Autor:
Toshihiro Nishisaka, Hiroki Tanaka, Akira Sumitani, Akihiko Takahashi, Kiichiro Uchino, Mizuo Maeda, Hakaru Mizoguchi, Tatsuo Okada
Publikováno v:
Applied Physics B: Lasers and Optics. 74:323-326
A new pump scheme for the realization of a practical Ar2 excimer laser operating at 126 nm has been proposed and investigated experimentally. In this scheme, pre-ionized high-pressure Ar gas was excited by an intense transversely-excited atmospheric
Autor:
Masayuki Konishi, Hidenori Watanabe, Yoshifumi Ueno, Takahito Kumazaki, Ryoichi Nohdomi, Toshio Yamashita, Masaki Nakano, Kazuaki Hotta, Kotaro Sasano, Tatsuya Ariga, Takashi Suganuma, Kiyoharu Nakao, Naoki Kitatochi, Hakaru Mizoguchi, Toshihiro Nishisaka
Publikováno v:
Journal of Photopolymer Science and Technology. 15:577-582
The roadmap of semiconductor fabrication predicts that the semiconductor market will demand 65nm node devices from 2004/2005. Therefore, an Ultra-Line-Narrowed F2 laser for dioptric projection systems is currently being developed under the ASET proje
Autor:
Toshihiro Nishisaka, Tatsuya Ariga, Ryoichi Nohdomi, Naoki Kitatochi, Takahito Kumazaki, Masaki Nakano, Hidenori Watanabe
Publikováno v:
IEEJ Transactions on Fundamentals and Materials. 122:205-210
Publikováno v:
The Review of Laser Engineering. 27:473-478
The latest technologies of highly energy-stabilized and narrow band excimer lasers for lithography are introduced. New RF preionization scheme, solid state pulsed power technology realize high stability of pulse energy. The wavelength is stabilized b
Autor:
Hiroshi Komori, Kouji Kakizaki, Masaki Nakano, Georg Soumagne, Krzysztof M. Nowak, Youichi Sasaki, Yabu Takayuki, Yukio Watanabe, Yanagida Tatsuya, Toshihiro Nishisaka, Yoshifumi Ueno, Hitoshi Nagano, Tamotsu Abe, Takeshi Asayama, Hiroshi Someya, Osamu Wakabayashi, Takashi Suganuma, Takanobu Ishihara, Masato Moriya, Hakaru Mizoguchi, Akira Sumitani, Akira Endo, Shinji Nagai, Hideo Hoshino
Publikováno v:
Alternative Lithographic Technologies.
We are developing a CO 2 laser driven Tin plasma EUV source for HVM EUVL. This approach enables cost-effective EUV power scaling by high-conversion efficiency and full recovery of Tin fuel. The RF-excited, multi 10 kW average power pulsed CO 2 laser
Autor:
N. Ohigashi, M. Kiyochi, Y. Tsunawaki, M. Fujita, K. Imasaki, S. Nakai, K. Mima, Shin-ichiro Kuruma, Michio Goto, Masayuki Kokubo, Naoya Nakao, Chiyoe Yamanama, T. Kase, M. Aoyama, Y. Akahane, F. Nakano, S. Matsuoka, K. Yamakawa, Goichi Ohmae, Takashi Yagi, Shinji Ito, Ahsa Moon, S. Izumida, S. Ono, Z. Liu, H. Ohtake, N. Sarukura, Jihong Geng, Satoshi Wada, Yoshiharu Urata, Hideo Tashiro, R. Minamihata, H. Kodama, J. Tanoue, J. Kawanaka, S. Kubodera, W. Sasaki, K. Kurosawa, Katsutomo Terashima, Hirokazu Tanaka, Hlrokazu Kubo, Toru Suzuki, Takeshi Ohta, Tatsuo Enami, Osamu Wakabayashi, Hakaru Mizoguchi, Ayako Ohbu, Takayuki Watanabe, Masaki Nakano, Tsukasa Hori, Toshihiro Nishisaka, Takashi Itou, Tetsuo KOJIMA, Susumu KONNO, Shuichi FUJIKAWA, Koji YASUI, Kenji YOSHIZAWA, Yusuke MORI, Takatomo SASAKI, Mitsuhiro TANAKA, Yukikatsu OKADA, Kiyoshi Shimamura, null Namujilatu, Tsuguo Fukuda, K. Matsubara, U. Tanaka, H. Imajo, K. Hayasaka, R. Ohmukai, S. Urabe, M. Watanabe, Masaki Oba, Masaaki Kato, Yoichiro Maruyama, Y. Koyata, S. Yamamoto, Y. Hirano, Nicolaie Pavel, Akihisa Sato, Atsushi Ito, Hiroaki Ohshima, Hiroki Yoshida, Yukio Sakagami, Toshifumi Hasama, H. Nishioka, A. Onizawa, N. Uehara, K. Ueda, Akihiko Nishimura, Hiroshi Takuma, M. Tsunekane, N Taguchi, H Inaba, Hitoshi SEKITA, Todd RUTHERFORD, Bill TULLOCHI, Tadashi KASAMATSU, Robert BYER, H. Matsui, T. Eguchi, Y. Kawada, T. Kanabe, M. Yamanaka, M. Nakatsuka, Y. Izawa, T. Kanzaki, H. Miyajima, M. Miyamoto, T. Kawashima, Y. Okada, H. Kan, Y. Akiyama, T. Takase, A. Takada, H. Yuasa, A. Ono, S. Yoshida, M. Nakayama, Masao Sato, Shinya Naito, Hisatada Machida, Nobuaki Iehisa, Norio Karube, M. Nishihata, N. Suzuki, T. Ohta, H. Fujiwara, T. Ichii, S. Kimura, M. Kimura, Y. Shoji, M. Imaki, T. Yanagisawa, O. Uchino, T. Nagai, C. Nagasawa, Tetsumi SUMIYOSHI, Tsunenori ARAI, Shunichi SATO, Miya ISHIHARA, Makoto KIKUCHI, Nilesh J. Vasa, Tatsuo Okada, Mitsuo Maeda, Toru Mizunami, Naoya MATSUOKA, Yutaka OKAZAKI, Ken KIKUCHI, Shigeru YAMAGUCHI, Kenzo NANRI, Tomoo FUJIOKA, A. Mori, K. Suzuki, J. Nakata, K. Kanari, Y Kodaira, Yashuhiro Naito, Hiroshi Nagano, Toru Hasuike, Manabu Taniwaki, Kouki Shimizu, Mikio Kumagai, Yoichi Takashima, M. Endo, M. Kawakami, S. Takeda
Publikováno v:
The Review of Laser Engineering. 27:23-24,27
Autor:
Tatsuya Yanagida, Georg Soumagne, Hideo Hoshino, Hiroshi Komori, Tamotsu Abe, Masaki Nakano, Hakaru Mizoguchi, Hiroshi Someya, Yoshifumi Ueno, Krzysztof M. Nowak, Akira Endo, Takayuki Yabu, Masato Moriya, Toshihiro Nishisaka, Koichi Toyoda, Akira Sumitani, Takashi Suganuma, Takeshi Asayama
Publikováno v:
SPIE Proceedings.
We are developing a laser produced plasma light source for high volume manufacturing (HVM) EUV lithography. The light source is based on a high power, high repetition rate CO2 laser system, a tin target and a magnetic ion guiding for tin treatment. T
Autor:
Hitoshi Nagano, Ryoichi Nohdomi, Hakaru Mizoguchi, Osamu Wakabayashi, Toshihiro Nishisaka, Hirotoshi Inoue, Hitoshi Tomaru, Masaya Yoshino, Takashi Saito, Akira Sumitani
Publikováno v:
SPIE Proceedings.
Mass production in 193 nm lithography is now starting and its target node is moving from 90 nm to 65 nm. The main performance requirement of ArF excimer laser in this situation is high power with ultra narrow spectrum for higher throughput. The other
Autor:
Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Masayuki Konishi, Takashi Suganuma, Masaki Nakano, Toshio Yamashita, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao
Publikováno v:
SPIE Proceedings.
Autor:
Kazuaki Hotta, Tatsuya Ariga, Naoki Kitatochi, Hakaru Mizoguchi, Takahito Kumazaki, Ryoichi Nohdomi, Toshihiro Nishisaka, Yoshifumi Ueno, Hiroshi Komori, Kiyoharu Nakao, Hidenori Watanabe, Kotaro Sasano
Publikováno v:
SPIE Proceedings.
The Association of Super-Advanced Electronics Technologies (ASET) started The F 2 Laser Lithography Development Project in March 2000, to clarify solutions of base F 2 lithography technologies. In this project, we are developing an ultra line-narrowe