Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Toshihiko Omote"'
Autor:
Toshihiko Omote, Tsuguo Yamaoka
Publikováno v:
Photosensitive Polyimides
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bbe1e1685ab9e200eb272a7997cbc6ed
https://doi.org/10.1201/9780203743423-7
https://doi.org/10.1201/9780203743423-7
Publikováno v:
Journal of Photopolymer Science and Technology. 7:293-298
Photochemical conversion of 4-(2′-nitrophenyl)-1, 4-dihydropyridine derivatives was found to act as a chromophore for photosensitive polyimide precursors giving a dual imaging-mode characteristics. The sensitivities and contrasts for the negative a
Publikováno v:
Polymers for Advanced Technologies. 4:277-287
A polyimide (6F-THP) with a tetrahydropyranyl group (THP) in its side chain has been synthesized. The THP group exhibits a high acidolysis rate in this polymer's film. This rate was faster than that of a tertbutoxycarbonyl group (t-BOC), which has be
Autor:
Tsuguo Yamaoka, Toshihiko Omote
Publikováno v:
Journal of Photopolymer Science and Technology. 6:283-290
Autor:
Toshihiko Omote, Tsuguo Yamaoka
Publikováno v:
Polymer Engineering and Science. 32:1634-1641
A novel positive-type polyimide precursor (BPDA/DDE) has been developed and examined. It is synthesized by the polycondensation of biphenyltetracarboxylic acid dianhydride and 4,4'-diamino-diphenyl ether, based on systems composed of dimethyl 1,4-dih
Publikováno v:
Journal of Photopolymer Science and Technology. 5:339-342
Publikováno v:
Journal of Photopolymer Science and Technology. 5:323-326
Publikováno v:
Macromolecules. 23:4788-4795
Un polyimide contenant des motifs phenols proteges par des groupes t-butoxycarbonyl est prepare et la cinetique d'acydolyse photo- ou thermoinduite des groupes protecteurs est etudiee. La deprotection entrai←ne la dissolution du polyimide en milieu
Publikováno v:
Macromolecules. 23:4796-4802
Les groupes diazo 1,2-naphtoquinone (NQD) sont fixes par esterification des groupes alcools du polyimide de depart. Selon la proportion des motifs NQD, les polyimides presentent un caractere de resist positif avec un revelateur aqueux basique ou un c
Publikováno v:
Journal of Polymer Science: Polymer Letters Edition. 28:59-64
Protected polyimide [N(CO) 2 Ph-C(CF 3 ) 2 -Ph(CO) 2 N-Ph(OCOOtBu)-C(CF 3 ) 2 -Ph(OCOOtBu)] n was prepared by polycondensation showed excellent lithographic performance in combination with the photoacid generator