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Autor:
Futoshi Iwata, Toshihiko Asao, Kazutaka Saigo, Shuichi Kikuchi, Osamu Takaoka, Masatoshi Yasutake, Takuya Nakaue
Publikováno v:
Japanese Journal of Applied Physics. 48:08JB20
Recently, photomask repairing techniques by scratching fabrication using an atomic force microscopy (AFM) system have been developed. However, the machining method using AFM produces cut debris during photomask repair, which induces problems and erro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7fd967a05c20cf936c6c531b9438dca1
https://doi.org/10.1143/jjap.48.08jb20
https://doi.org/10.1143/jjap.48.08jb20
