Zobrazeno 1 - 10
of 31
pro vyhledávání: '"Toshiharu Nishimura"'
Publikováno v:
IEEJ Transactions on Power and Energy. 131:493-501
Autor:
Akira Taguchi, Satoshi Akamaru, Toshiharu Nishimura, Minoru Umeda, Takayuki Abe, Mitsuhiro Inoue
Publikováno v:
Electrochimica Acta. 54:4764-4771
The CO oxidation on non-alloyed Pt and Ru electrocatalysts prepared by the polygonal barrel-sputtering method was investigated. Samples were prepared by sputtering Pt and Ru separately at room temperature. From the X-ray diffraction (XRD) measurement
Autor:
Shigeo Nagaya, Kazuhiro Matsumura, Yoshio Ogama, Kazumasa Nagao, Taketsune Nakamura, Naoji Kashima, Toshiharu Nishimura
Publikováno v:
TEION KOGAKU (Journal of the Cryogenic Society of Japan). 44:112-119
This paper describes a fundamental study on the generation characteristics of a high Tc superconducting induction/synchronous machine (HTS-ISM), with a structure the same as squirrel-cage induction machines. Bi-2223/Ag multifilamentary tapes are util
Publikováno v:
The Journal of the Geological Society of Japan. 107:749-754
Autor:
Seiji Nozaki, Mahito Watanabe, Yasuo Yamamoto, Toshiharu Nishimura, Atsushi Takemura, Makoto Miyake
Publikováno v:
The Journal of the Geological Society of Japan. 105:116-121
前期-中期中新世の珪藻化石が岡山県高山市地域の備北層群, および津山地域の勝田層群から産出した.これらの珪藻化石により両層群の年代を精度良く決定した.高山市地域の備北層群上
Autor:
Yasushi Ohkubo, Shiho Sasaki, Satoshi Yusa, Masao Ushida, Naoya Hayashi, Hideaki Mitsui, Yuki Shiota, Toshiyuki Suzuki, Toshiharu Nishimura, Osamu Nozawa, Hiroshi Mohri, Kenji Noguchi
Publikováno v:
SPIE Proceedings.
A new att-PSM shifter for both F 2 and high-transmittance ArF lithography was developed. This shifter consists of SiON / TaHf in stacked layers. SiON for phase shift layer has a moderate transmittance and refractive index, and has sufficient laser du
Autor:
Kotaro Ooishi, Yasuyoshi Sasagawa, Naoya Hayashi, Hideaki Sakurai, Kazuo Sakamoto, Hiroyuki Miyashita, Yoshihisa Oosaki, Mika Nakao, Yukihiko Esaki, Shinji Tanabe, Masamitsu Itoh, Toshiharu Nishimura
Publikováno v:
SPIE Proceedings.
In recent years, more precise pattern dimension control (CD control) on a photomask has been required than ever as finer-line of IC pattern progresses. In the case of the conventional development (spray-development, puddle-development), CD control is
Autor:
Toshiharu, Nishimura
Publikováno v:
Rinsho byori. The Japanese journal of clinical pathology.
Autor:
Masamitsu Itoh, Toshiharu Nishimura, Naoya Hayashi, Kotaro Ooishi, Mika Nakao, Hideaki Sakurai, Yukihiko Esaki, Kazuo Sakamoto, Hiroyuki Miyashita
Publikováno v:
SPIE Proceedings.
The loading effect is becoming a great issue in mask fabrication. To reduce CD error due to resist load, we have developed a developer based on a new concept, Proximity Gap Suction Development (PGSD), involving the use of a nozzle to spout developer
Publikováno v:
Japanese Journal of Oral & Maxillofacial Surgery. 36:1618-1620