Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Toshiharu KIKUCHI"'
Autor:
Muneyuki Imafuku, Satoshi Sasaki, Takeharu Mori, Toshiharu Kikuchi, Yasuo Takagi, Toshiyuki Mizutani
Publikováno v:
Review of Scientific Instruments. 66:1802-1805
Several new goniometers were installed on the triple‐axis/four‐circle diffractometer, SIN‐1 at PF‐BL3A to improve data acquisition ability and beam collimation. The most prominent improvement is development and installation of a new two‐cir
Autor:
Hidenobu Nagai, Tatsu Sawada, Toshiharu Kikuchi, Wataru Kimura, Tohru Kimura, Yoshiharu Yamada
Publikováno v:
Journal of Cataract and Refractive Surgery. 19:635-639
We studied shape recovery ratios of several single- and three-piece intraocular lens (IOL) haptics after conducting compression tests for various lengths of time. Results of the comparison of poly(methyl methacrylate) (PMMA) IOL haptics configured of
Autor:
Hidenobu Nagai, Tatsu Sawada, Yoshiharu Yamada, Tohru Kimura, Hirotaka Toda, Wataru Kimura, Toshiharu Kikuchi
Publikováno v:
Journal of Cataract and Refractive Surgery. 18:547-553
Since understanding the mechanical properties of intraocular lens (IOL) haptic materials can minimize decentration after surgery, we have examined shape recovery ratios of various intraocular lens haptics (polypropylene [PP], polyvinylidene fluoride
Autor:
Satoshi Sasaki, Koichi Nose, Hirofumi Morikawa, Koichi Kawasaki, Shuichi Yamazaki, Toshiharu Kikuchi, Yasuo Takagi
Publikováno v:
Review of Scientific Instruments. 63:1023-1026
A triple‐axis/four‐circle diffractometer was newly designed and installed in the experimental station BL‐3A of the Photon Factory. The station is currently used for multipurpose works such as diffraction, scattering, and absorption in the x‐r
Publikováno v:
SPIE Proceedings.
Recently, extremely-high-quality-quartz substrates have been demanded for advancing ArF-lithography. HOYA has developed a novel inspection method for interior defects as well as surface defects. The total internal reflection of the substrate is emplo
Autor:
Yasushi Ohkubo, Toshifumi Yokoyama, Yasutaka Morikawa, Toshiharu Kikuchi, Yasuhisa Kitahata, Atsushi Kawaguchi
Publikováno v:
23rd European Mask and Lithography Conference.
Hyper-NA lithography with polarized light illumination is introduced as the solution of 45nm or 32nm node technology. In that case, consideration of new characteristics of masks and substrates has been required. One of these is birefringence of quart
Autor:
Hiroyuki Kohzu, Toshiyuki Mizutani, Satoshi Sasaki, Takeharu Mori, Toshiharu Kikuchi, Yasuo Takagi
Publikováno v:
Review of Scientific Instruments. 66:1706-1708
A new mechanism to balance the torque induced on goniometer arms was developed to prevent serious mechanical difficulties of goniometers. Since the amount of the torque induced by its own weight depends on the goniometer angle, a new angle‐dependen
Publikováno v:
Journal of synchrotron radiation. 5(Pt 3)
A new image-plate reader which can read image plates (IPs) having various sizes and shapes has been developed. The machine consists of a rotating laser head to induce luminescence photons from IPs and a porous cylindrical holder made of a composite o
Publikováno v:
IEEJ Transactions on Power and Energy. 98:837-844
Publikováno v:
Electrical Engineering in Japan. 98:100-107