Zobrazeno 1 - 10
of 42
pro vyhledávání: '"Toshiaki Tatsuta"'
Autor:
Ram S. Katiyar, James F. Scott, Ashok Kumar, Shin-ichi Motoyama, Toshiaki Tatsuta, Osamu Tsuji, M. Echizen
Publikováno v:
Integrated Ferroelectrics. 133:9-14
ZnO thin films were deposited on SiO2/Si(100) and single-crystal MgO substrate using pulsed laser deposition. High-quality ZnO thin films were fabricated on both substrates successfully. Interdigital transducer-shaped Al electrodes were used for meas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b3859f54e107a4c68726cf71297d1ad1
https://doi.org/10.1080/10584587.2012.660862
https://doi.org/10.1080/10584587.2012.660862
Autor:
Margarita Correa, Toshiaki Tatsuta, Finlay D. Morrison, M. M. Saad, Hong Jin Fan, S. Kawasaki, Osamu Tsuji, James F. Scott, Gustau Catalan, J. M. Gregg
Publikováno v:
Integrated Ferroelectrics. 95:180-186
A modification of liquid source misted chemical deposition process (LSMCD) with heating mist and substrate has developed, and this enabled to control mist penetrability and fluidity on sidewalls of three-dimensional structures and ensure step coverag
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54a7dcb7d26923c5d514f8d002edaa2d
https://doi.org/10.1080/10584580701758793
https://doi.org/10.1080/10584580701758793
Autor:
Xiaojie Lou, Finlay D. Morrison, James F. Scott, Ming Zhang, M. Miyake, Osamu Tsuji, T. J. Leedham, Toshiaki Tatsuta
Publikováno v:
Integrated Ferroelectrics. 74:165-172
We have found that a hafnia precursor (hafnium bis-isopropoxy bis-thd) for chemical solution deposition (CSD) yields a crystallization temperature ca. 80°C above that usually found for CSD film deposition (e.g., 521°C for Hf-butoxide). These result
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c87f3527fdc2074370ff739711398b8
https://doi.org/10.1080/10584580500414176
https://doi.org/10.1080/10584580500414176
Publikováno v:
Integrated Ferroelectrics. 62:129-132
This paper presents the advanced Liquid Source Misted Chemical Deposition (LSM-CD) system equipped with a new atomizer and a refiner with ultrasonic vibration (USV). This system has been developed based on conventional LSM-CD system having 2–3 μm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7beb1ce3c066c49bf7a6a474b1288bae
https://doi.org/10.1080/10584580490456182
https://doi.org/10.1080/10584580490456182
Publikováno v:
Japanese Journal of Applied Physics. 42:7112-7115
Conventionally, argon plasma has been used as a method of improving wire bonding performance by removing contaminants (nickel, nickel oxides, and impurities concentrated on the gold surface) from the gold bond pads after the die-bond cure process. Th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a3159d8836d71c62e253da0715e85f2
https://doi.org/10.1143/jjap.42.7112
https://doi.org/10.1143/jjap.42.7112
Autor:
T. J. Leedham, Toshiaki Tatsuta, James F. Scott, Finlay D. Morrison, Marin Alexe, Osamu Tsuji
Publikováno v:
Microelectronic Engineering. 66:591-599
We describe the application of misted chemical solution deposition (CSD) techniques to processing of ferroelectric-filled porous silicon photonic devices and of novel precursor medium- and high-dielectric constant films for gate oxide and memory appl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f76b603554584f94b4bd0c98b0a2d78c
https://doi.org/10.1016/s0167-9317(02)00970-x
https://doi.org/10.1016/s0167-9317(02)00970-x
Publikováno v:
Integrated Ferroelectrics. 53:287-297
The liquid source misted chemical deposition (LSMCD) method has attracted much attention for fabricating integrated ferroelectric random access memories (FeRAMs). We have developed a new atomizer and an advanced refiner with ultrasonic vibration whic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14375eed88cc46dbcaff8948858f4631
https://doi.org/10.1080/714040677
https://doi.org/10.1080/714040677
Autor:
Shinji Nakagami, Hirohiko Nakano, Kikuko Yoshimura, Takeshi Minaguchi, Osamu Tsuji, Toshiaki Tatsuta
Publikováno v:
Journal of Photopolymer Science and Technology. 15:283-290
Changes of discharge state in inductively coupled plasma (ICP) were investigated by use of a radio frequency (RF) impedance analyzer. A voltage loaded on the ICP coil and a current flowing within the coil were plotted against the RF power, and the tw
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b06e80fe781c2345b13ef837b1fd53ce
https://doi.org/10.2494/photopolymer.15.283
https://doi.org/10.2494/photopolymer.15.283
Publikováno v:
Journal of Photopolymer Science and Technology. 14:73-80
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::88a175e541c64279d260c031d544e9d7
https://doi.org/10.2494/photopolymer.14.73
https://doi.org/10.2494/photopolymer.14.73
Autor:
Keiko Toyozawa, Zempachi Ogumi, Hirohiko Nakano, Osamu Tsuji, Takeshi Abe, Toshiaki Tatsuta, Kikuko Yoshimura, Takeshi Minaguchi
Publikováno v:
Journal of Photopolymer Science and Technology. 13:13-20
In order to prepare a cation-exchange membrane, trifluoromethanesulfonic acid (TFMS) and octafluorocyclobutane (OFCB) were plasma-polymerized. Addition of water vapor to the plasma reactor was more effective in preserving the sulfonic acid group in t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::75fc9d4a2e7d00e666e274f795185dfc
https://doi.org/10.2494/photopolymer.13.13
https://doi.org/10.2494/photopolymer.13.13