Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Toshiaki Narusawa"'
Publikováno v:
東京工芸大学工学部紀要 = The Academic Reports, the Faculty of Engineering, Tokyo Polytechnic University. 35(1):87-94
Improvement of pharmaceutical potential of all-trans retinoic acid with hydroxypropyl-β-cyclodextrin
Autor:
Keiko Takahashi, Masahiko Ooe, Keigo Aoi, Akiyoshi Takada, Hiroto Nakamura, Taizo Seki, Sayo Morimoto, Toshiaki Narusawa
Publikováno v:
Journal of Inclusion Phenomena and Macrocyclic Chemistry. 70:389-396
2-Hydroxypropyl-β-cyclodextrin (HP-β-CyD) includes all-trans retinoic acid (RA), covering the double-bond area of RA with substituted hydroxypropyl groups on CyD ring, as proved by the nuclear Overhauser effect (NOE) between methylene protons on th
Publikováno v:
東京工芸大学工学部紀要 = The Academic Reports, the Faculty of Engineering, Tokyo Polytechnic University. 28(1):103-112
Publikováno v:
MRS Proceedings. 660
We developed a method to predict the charge transport (CT) type (hole or electron) in molecular materials that uses molecular orbital calculations. The hole-and-electron-mobility ratios of molecular materials were calculated based on molecular struct
Autor:
Toshiaki Yoshihara, Akihiro Mochizuki, Hirofumi Saito, Yoshikazu Yabe, Toshiaki Narusawa, Shigeo Kasahara
Publikováno v:
Journal of the Society for Information Display. 1:411
— A 1M-pixel full-color projection display with a very simple optical system using a conventional overhead projector has been developed. This display uses the nematic-cholesteric phase-transition liquid-crystal display and a micro-color-filter. Mor
Photoconduction of Copper Phthalocyanine-Binder Photoconductor Sensitized with Poly-N-vinylcarbazole
Publikováno v:
IEEE Transactions on Industry Applications. :1642-1646
A nontoxic organic photoconductor for near infrared light has been developed. It consists of poly-N-vinylcarbazole (PVCz) dispersed in a copper phthalocyanine (CuPc)-binder resin system. PVCz has been selected from among several electron donating com
Publikováno v:
Industrial & Engineering Chemistry Product Research and Development. 23:609-612
Publikováno v:
SPIE Proceedings.
Plasma-developable positive and negative resists with a high etching rate ratio between exposed and unexposed areas have been developed for electron-beam lithography. The negative resist systems are composed of radiation-degradation polymers such as
Autor:
Toshiaki Narusawa, Suketaka Ito
Publikováno v:
Chemischer Informationsdienst. Organische Chemie. 1
Autor:
Toshiaki Narusawa, Suketaka Ito
Publikováno v:
Bulletin of the Chemical Society of Japan. 43:2257-2258