Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Toshiaki Motonaga"'
Publikováno v:
Colloids and Surfaces. 146:387-395
A stable enzyme film was prepared on a platinum electrode by casting organic solutions of a lipid-coated enzyme. The glucose oxidase (GOD)-immobilized electrode acted as a glucose sensor with a high sensitivity and a short response time. When the lip
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fe580a1aa9d88ebd343e223995f4daa2
http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100559511
http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100559511
Autor:
Naoya Hayashi, Masaharu Nishiguchi, Shiho Sasaki, Tsuyoshi Amano, Tsukasa Abe, Hiroshi Mohri, Iwao Nishiyama, Toshiaki Motonaga, Yuusuke Tanaka
Publikováno v:
SPIE Proceedings.
EUVL mask process of absorber layer, buffer layer dry etching and defect repair were evaluated. TaGeN and Cr were selected for absorber layer and buffer layer, respectively. These absorber layer and buffer layer were coated on 6025 Qz substrate. Two
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::125cd594aced5907be2ee44777206cd0
https://doi.org/10.1117/12.569397
https://doi.org/10.1117/12.569397
Autor:
Iwao Nishiyama, Toshiaki Motonaga, Hiromasa Yamanashi, Naoya Hayashi, Tsuyoshi Amano, Masaharu Nishiguchi, Hiroshi Mohri, Tsukasa Abe, Yuusuke Tanaka, Shiho Sasaki
Publikováno v:
SPIE Proceedings.
EUVL mask process of absorber layer dry etching and defect repair were evaluated. TaGeN and Cr were selected for absorber layer and buffer layer, respectively. These absorber layer and buffer layer were coated on 6025 Qz substrate. Two dry etching pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f28f91962a2cd0b217fa711a4650542
https://doi.org/10.1117/12.557817
https://doi.org/10.1117/12.557817
Autor:
Naoya Hayashi, Hiroshi Mohri, Morihisa Hoga, Toshiaki Motonaga, Shiho Sasaki, Kenji Noguchi, Yasutaka Morikawa, Masaharu Nishiguchi
Publikováno v:
SPIE Proceedings.
HT-PSMs (Half Tone Phase Shifting Masks) are well known as one of the key technologies to obtain high resolution and expand process window of lithography. And furthermore, high transmission HT-PSMs are expected to show better DOF and MEEF than conven
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3c883b84c4e8d4d816e7449d31aaa9c4
https://doi.org/10.1117/12.468201
https://doi.org/10.1117/12.468201
Autor:
Toshiaki Motonaga, Hiro-O Nakagawa, Hiroshi Mohri, Takafumi Shinjuku-ku Okamura, Junji Fujikawa, Naoya Hayashi, Toshifumi Yokoyama, Satoshi Shinjuku-ku Yusa
Publikováno v:
SPIE Proceedings.
We developed a new shifter for half-tone phase shift masks (HTPSMs) in ArF and F2 lithography, using a TaSiOx film. We have adopted the bilayer structure, which consists of a TaSiOx layer and a transmittance control layer (TCL), to make various trans
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8bd2dbd28b2170118effd50e4cb2db9f
https://doi.org/10.1117/12.438338
https://doi.org/10.1117/12.438338
Autor:
Toshiaki Motonaga, M. Ohtsuki, Y. Kinase, H. Nakagawa, Toshifumi Yokoyama, Hiroshi Mohri, Junji Fujikawa, Naoya Hayashi
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7eb6bf5cba1bc1a2691e3e8dab424070
https://doi.org/10.1117/12.438337
https://doi.org/10.1117/12.438337