Zobrazeno 1 - 10
of 41
pro vyhledávání: '"Toru Fujimori"'
Publikováno v:
Journal of Advanced Mechanical Design, Systems, and Manufacturing, Vol 6, Iss 6, Pp 999-1014 (2012)
Numerical error compensation is a cost-effective way to further improve the accuracy of high precision CNC machine tools. This paper discusses the major techniques for numerical error compensation on high precision machine tools. First, the high accu
Externí odkaz:
https://doaj.org/article/f9c77f9d6e3b4b1dadcd9f5f8e4c59e2
Autor:
Keiyu Ou, Naohiro Tango, Nishiki Fujimaki, Kazuhiro Marumo, Nobuhiro Hiura, Satomi Takahashi, Toru Fujimori
Publikováno v:
Advances in Patterning Materials and Processes XL.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::08221889798f813567c631dc99c4d07d
https://doi.org/10.1117/12.2657421
https://doi.org/10.1117/12.2657421
Autor:
Toru Fujimori
Publikováno v:
2022 International Symposium on Semiconductor Manufacturing (ISSM).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb3a3450fe115db198619613b3a84c36
https://doi.org/10.1109/issm55802.2022.10026917
https://doi.org/10.1109/issm55802.2022.10026917
Autor:
Toru Fujimori
Publikováno v:
2022 International Workshop on Advanced Patterning Solutions (IWAPS).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3ad1b8333a48067ef1808716dc10e01d
https://doi.org/10.1109/iwaps57146.2022.9972294
https://doi.org/10.1109/iwaps57146.2022.9972294
Autor:
Toru Fujimori
Publikováno v:
2022 China Semiconductor Technology International Conference (CSTIC).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4989e70881ec3878573d41fd0a76ee93
https://doi.org/10.1109/cstic55103.2022.9856718
https://doi.org/10.1109/cstic55103.2022.9856718
Autor:
Toru Fujimori, Kazuo Yamazaki, Kayoko Taniguchi, Shigeaki Maruyama, Shinya Kidani, Masakazu Soshi, Naruhiro Irino
Publikováno v:
Journal of Manufacturing Processes. 56:1286-1293
In order to achieve high accuracy of computer numerical controlled (CNC) machine tools, various error compensation functions are implemented in the CNC control system. However, these error compensations are not designed to track the dynamic change in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3cbd60e0bad5c2235ae059c047e356a9
https://doi.org/10.1016/j.jmapro.2020.04.023
https://doi.org/10.1016/j.jmapro.2020.04.023
Autor:
Toru Fujimori
Publikováno v:
2021 International Workshop on Advanced Patterning Solutions (IWAPS).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3fe6d46c89866fbae1bd7d9dd6db8045
https://doi.org/10.1109/iwaps54037.2021.9671060
https://doi.org/10.1109/iwaps54037.2021.9671060
Autor:
Naohiro Tango, Kei Yamamoto, Michihiro Shirakawa, Keiyu Ou, Akiyoshi Goto, Mitsuhiro Fujita, Yasuharu Shiraishi, Toru Fujimori
Publikováno v:
Journal of Photopolymer Science and Technology. 32:445-448
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6b72f4f181292aa11846c0c93536cbbe
https://doi.org/10.2494/photopolymer.32.445
https://doi.org/10.2494/photopolymer.32.445
Autor:
Toru Fujimori
Publikováno v:
2021 China Semiconductor Technology International Conference (CSTIC).
Extreme ultraviolet (EUV) lithography is almost ready for realize 7nm generation manufacturing and beyond. A key factor for the realization of EUV lithography is the choice of EUV resist materials that are capable of resolving below 15nm half pitch w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::045e15024177fbdde0285613583c5756
https://doi.org/10.1109/cstic52283.2021.9461523
https://doi.org/10.1109/cstic52283.2021.9461523
Autor:
Toru Fujimori
Publikováno v:
2020 China Semiconductor Technology International Conference (CSTIC).
Extreme ultraviolet (EUV) lithography is almost ready for realize 7nm generation manufacturing and beyond. A key factor for the realization of EUV lithography is the choices of EUV resist materials that are capable of resolving below 15nm half pitch
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fd754c14491201596999e1f8a9eb03d7
https://doi.org/10.1109/cstic49141.2020.9282490
https://doi.org/10.1109/cstic49141.2020.9282490