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pro vyhledávání: '"Tony Vander Heyden"'
Autor:
C. Grant Willson, Shang Ho Lin, Colin J. Brodsky, Kyle Patterson, Raymond J. Hung, Brian C. Trinque, Takashi Chiba, Tony Vander Heyden, Jeff D. Byers, Hoang Vi Tran, Heather F. Johnson, Andrew Thomas Jamieson, Shintaro Yamada, Mark Somervell, Will Conley, Sungseo Cho
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:3396
Many semiconductor device manufacturers plan to make products with 157 nm lithography beginning in 2004. There is, at this time, no functional photoresist suitable for 157 nm exposure. Developing resist materials for 157 nm lithography is particularl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b5ec449f507d887e43795a1c0e7132c4
https://doi.org/10.1116/1.1321762
https://doi.org/10.1116/1.1321762
