Zobrazeno 1 - 10
of 54
pro vyhledávání: '"Tonglin Huo"'
Autor:
Xiangyue Liu, Zhe Zhang, Hongxuan Song, Qiushi Huang, Tonglin Huo, Hongjun Zhou, Runze Qi, Zhong Zhang, Zhanshan Wang
Publikováno v:
Micromachines, Vol 14, Iss 3, p 526 (2023)
The Mo/Si multilayer mirror has been widely used in EUV astronomy, lithography, microscopy and other fields because of its high reflectivity at the wavelength around 13.5 nm. During the fabrication of Mo/Si multilayers on large, curved mirrors, shado
Externí odkaz:
https://doaj.org/article/9bb1bb7c8da14c1280be4d854fce616b
Autor:
Hongxuan Song, Zhe Zhang, Xiangyue Liu, Qiushi Huang, Hongjun Zhou, Tonglin Huo, Runze Qi, Zhong Zhang, Zihua Xin, Zhanshan Wang
Publikováno v:
Applied Optics. 62:2636
To investigate the thermal stability of Mo/Si multilayers with different initial crystallinities of Mo layers, two kinds of Mo/Si multilayers were deposited by DC magnetron sputtering and annealed at 300°C and 400°C. The period thickness compaction
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::244bfd7c648653ade458befbae328ea7
https://doi.org/10.1364/ao.482940
https://doi.org/10.1364/ao.482940
Autor:
Yue Yu, Zeyi Ye, Li Jiang, Qianxia Yao, Shuangying Li, Jiali Wu, Jinlong Zhang, Qiushi Huang, Chun Xie, Andrey Sokolov, Hongjun Zhou, Tonglin Huo, Wenbin Li, Zhanshan Wang
A laboratory based reflectometer designed for characterizing the reflectivity of optical coatings in 30 to 200 nm wavelength range was recently developed at IPOE. An RF produced gas discharge light source is applied to generate characteristic lines.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c13ab53289127908d8f1f83cd3934301
http://www.helmholtz-berlin.de/pubbin/oai_publication?VT=1&ID=108995
http://www.helmholtz-berlin.de/pubbin/oai_publication?VT=1&ID=108995
Publikováno v:
Optical Engineering. 61
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::342600fc9a3b5deb0677cbe05c2da242
https://doi.org/10.1117/1.oe.61.3.031205
https://doi.org/10.1117/1.oe.61.3.031205
Autor:
Xiangdong Xu, Kay Dietrich, Dakui Lin, Franz Schäfers, Keqiang Qiu, Tonglin Huo, Huoyao Chen, Ernst-Bernhard Kley, Yilin Hong, Ying Liu, Zhengkun Liu, Stefanie Kroker, Hongjun Zhou, M.G. Sertsu, Andrey Sokolov
Publikováno v:
Journal of Synchrotron Radiation
A method comprising near-field holography with an electron beam lithography-written phase mask was developed herein. Soft X-ray varied-line-spacing gratings with a central groove density greater than 3000 lines mm−1 were fabricated using this metho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8f8bd79e9f6c86d9155b49caa6cbddc0
http://europepmc.org/articles/PMC6730620
http://europepmc.org/articles/PMC6730620
Publikováno v:
Optical Design and Testing IX.
Aluminum mirrors with high reflectivity have a wide range of applications in the vacuum ultraviolet, such as for space observation, synchrotron radiation. Due to the oxidation of Al has great effect on the reflectivity below the wavelength of 160 nm,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5095d35d8a12baaf4be58237bdb6e5d2
https://doi.org/10.1117/12.2537954
https://doi.org/10.1117/12.2537954
Publikováno v:
Tenth International Conference on Thin Film Physics and Applications (TFPA 2019).
High reflectivity of mirrors is very important for many applications in the vacuum ultraviolet, such as for space observation, synchrotron radiation. This paper focuses on the substrate temperature’s effect on the performance of Al mirrors when dep
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a1540e9a11189a434daa63b5e1bbc7e
https://doi.org/10.1117/12.2540004
https://doi.org/10.1117/12.2540004
Autor:
Qiushi Huang, Yufei Feng, Tonglin Huo, Zhe Zhang, Feng Qinxu, Jiaqi Chen, Zhanshan Wang, Runze Qi, Hongjun Zhou
Publikováno v:
Optical Interference Coatings Conference (OIC) 2019.
Narrowband Mg/SiC multilayer mirrors working around 30.4 nm with a significantly reduced bandwidth (FWHM ≈ 0.7 nm) basing on high order reflection have been designed and fabricated by direct-current (DC) magnetron sputtering.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac7a79fb767f01f7a4a2f7bd651ff307
https://doi.org/10.1364/oic.2019.fb.4
https://doi.org/10.1364/oic.2019.fb.4
Autor:
Hai-Feng Wang, Tonglin Huo, Xiaodong Wang, Peng Zhou, Mao Shilei, Bo Chen, Yang Liu, Yunqi Wang, Shuai Ren, Hongjun Zhou
Publikováno v:
Optik. 204:164213
Fe Ⅻ line (19.5 nm) is one of important targets of imaging detection in solar spectrum, and 19.5 nm multilayer mirrors were employed to reflect 19.5 nm line and suppress sidelobe. 19.5 nm multilayer mirrors with a bandwidth of 1.0 nm are in demand
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c6c8dfb9bdb92a29c583bdc744797ee6
https://doi.org/10.1016/j.ijleo.2020.164213
https://doi.org/10.1016/j.ijleo.2020.164213
Autor:
Hongchang Wang, Xiaowei Yang, Zhanshan Wang, Hongjun Zhou, Qiushi Huang, Jiangtao Feng, Angelo Giglia, Zhong Zhang, Runze Qi, Xudong Xu, Tonglin Huo
Publikováno v:
Optics express 27 (2019): 38493–38508. doi:10.1364/OE.27.038493
info:cnr-pdr/source/autori:Feng, Jiangtao; Huang, Qiushi; Qi, Runze; Xu, Xudong; Zhou, Hongjun; Huo, Tonglin; Giglia, Angelo; Yang, Xiaowei; Wang, Hongchang; Zhang, Zhong; Wang, Zhanshan/titolo:Stability of Cr%2FC multilayer during synchrotron radiation exposure and thermal annealing/doi:10.1364%2FOE.27.038493/rivista:Optics express/anno:2019/pagina_da:38493/pagina_a:38508/intervallo_pagine:38493–38508/volume:27
info:cnr-pdr/source/autori:Feng, Jiangtao; Huang, Qiushi; Qi, Runze; Xu, Xudong; Zhou, Hongjun; Huo, Tonglin; Giglia, Angelo; Yang, Xiaowei; Wang, Hongchang; Zhang, Zhong; Wang, Zhanshan/titolo:Stability of Cr%2FC multilayer during synchrotron radiation exposure and thermal annealing/doi:10.1364%2FOE.27.038493/rivista:Optics express/anno:2019/pagina_da:38493/pagina_a:38508/intervallo_pagine:38493–38508/volume:27
The stability of Cr/C multilayer during irradiation or thermal annealing was investigated using grazing incidence X-ray reflectivity measurement, X-ray photoelectron spectroscopy, X-ray diffraction analysis, small-angle X-ray scattering analysis, and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2832cb70d6c85669af019ce109a9eaf1
https://doi.org/10.1364/oe.27.038493
https://doi.org/10.1364/oe.27.038493