Zobrazeno 1 - 10
of 75
pro vyhledávání: '"Tonchev Svetlen"'
Autor:
Bourgin Yannick, Vartiainen Ismo, Jourlin Yves, Kuittinen Markku, Celle Frédéric, Tonchev Svetlen, Parriaux Olivier, Niemi Tapio
Publikováno v:
Journal of the European Optical Society-Rapid Publications, Vol 6, p 11016s (2011)
An optimized achromatic high-efficiency monolithic phase mask is presented whose principle was demonstrated and described in reference [1]. The mask comprises three submicron period diffraction gratings at a single substrate side that create a purely
Externí odkaz:
https://doaj.org/article/b026cf2eefd24f70a813878ddca22109
Publikováno v:
In Optics and Laser Technology August 2023 163
Publikováno v:
In Journal of Quantitative Spectroscopy and Radiative Transfer December 2012 113(18):2499-2502
Autor:
Tonchev, Svetlen, Parriaux, Olivier
Publikováno v:
In Photonics and Nanostructures - Fundamentals and Applications October 2012 10(4):651-656
Publikováno v:
In Sensors & Actuators: B. Chemical 2011 159(1):27-32
Publikováno v:
In Solid State Sciences 2010 12(11):1870-1872
Autor:
Tonchev, Svetlen, Parriaux, Olivier1 parriaux@univ-st-etienne.fr
Publikováno v:
Plasmonics. Jun2013, Vol. 8 Issue 2, p949-954. 6p. 1 Color Photograph, 1 Black and White Photograph, 1 Diagram, 3 Graphs.
Publikováno v:
AIP Conference Proceedings; 2019, Vol. 2075 Issue 1, p030007-1-030007-7, 7p, 3 Diagrams
Autor:
Bourgin, Yannick, Jourlin, Yves, Tonchev, Svetlen, Vartiainen, Ismo, Parriaux, Olivier, Kuittinen, Markku, Talneau, Anne
Publikováno v:
proceeding of the 2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011)
2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011)
2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, Germany. pp.4391
2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011)
2nd EOS Conference on Manufacturing of Optical Components (EOSMOC 2011), May 2011, Munich, Germany. pp.4391
International audience; The applicability domain of phase-masks for the manufacturing of gratings is widely expanded by breaking the limits of a so far very narrow spatial frequency spectral width. This is a result of searching for high index deep-UV
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::5daa4924e1804dbad3844239937788c9
https://hal-ujm.archives-ouvertes.fr/ujm-00602526
https://hal-ujm.archives-ouvertes.fr/ujm-00602526
Autor:
Bourgin, Yannick, Jourlin, Yves, Tonchev, Svetlen, Vartiainen, Ismo, Kuittinen, Markku, Talneau, Anne, Parriaux, Olivier
Publikováno v:
proceeding of the EOS AM 2010
EOS Annual Meeting 2010
EOS Annual Meeting 2010, Oct 2010, Paris, France. pp.3637
EOS Annual Meeting 2010
EOS Annual Meeting 2010, Oct 2010, Paris, France. pp.3637
International audience; The very restricted range of grating periods printable by standard silica phase-masks is here extended from close to the 45 nm CD-node to arbitrarily large periods by the appropriate choice of material and interference-generat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::bc8c1a078b71bc08704295422b13fc0f
https://hal.archives-ouvertes.fr/hal-00537951
https://hal.archives-ouvertes.fr/hal-00537951