Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Tomoyasu Shohjoh"'
Autor:
Gian Francesco Lorusso, Danilo De Simone, Mohamed Zidan, Joren Severi, Alain Moussa, Bappaditya Dey, Sandip Halder, Alex Goldenshtein, Kevin Houchens, Gaetano Santoro, Daniel Fischer, Angelika Muellender, Chris Mack, Tsuyoshi Kondo, Tomoyasu Shohjoh, Masami Ikota, Anne-Laure Charley, Stefan De Gendt, Philippe Leray
Publikováno v:
Japanese Journal of Applied Physics. 62:SG0808
One of the many constraints of high numerical aperture extreme ultraviolet lithography is related to resist thickness. A critical consequence of moving from the current 0.33 to 0.55 NA (high NA) is depth of focus reduction. The question we seek to an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ccdf54108f8c454e658d681a4ef2a0c
https://doi.org/10.35848/1347-4065/acc3a4
https://doi.org/10.35848/1347-4065/acc3a4
