Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Tomoya Tamura"'
Autor:
Tomoya TAMURA, Chikara KUDO, Haruhi SHONO, Saori SAKAMOTO, Toru OGATA, Haruka YOSHIDA, Ena CHIBA
Publikováno v:
Journal of the Japan Veterinary Medical Association. 76:e116-e121
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a6c3859b7f92dc3e3928e065f808463
https://doi.org/10.12935/jvma.76.e116
https://doi.org/10.12935/jvma.76.e116
Publikováno v:
JAPANESE JOURNAL OF MULTIPHASE FLOW. 36:95-106
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::35a6b918fdabd0a0e8220542691c672b
https://doi.org/10.3811/jjmf.2022.008
https://doi.org/10.3811/jjmf.2022.008
Publikováno v:
Journal of Mineralogical and Petrological Sciences. 113:310-315
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::671226a7bfb4a7bf44c7bb430204341e
https://doi.org/10.2465/jmps.180717a
https://doi.org/10.2465/jmps.180717a
Publikováno v:
Journal of Mineralogical and Petrological Sciences. 112:324-335
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ad125ef4df52f4d98e895d9745909061
https://doi.org/10.2465/jmps.170330a
https://doi.org/10.2465/jmps.170330a
Autor:
Atsushi Kyono, Yuki Nakamoto, Stephen A. Gramsch, Masato Kato, Tomoya Tamura, Masafumi Sakata, Takamitsu Yamanaka
Publikováno v:
American Mineralogist. 100:1752-1761
The Jahn-Teller effect at Cu2+ in cuprospinel CuFe2O4 was investigated using high-pressure single-crystal synchrotron X-ray diffraction techniques at beamline BL10A at the Photon Factory, KEK, Japan. Six data sets were collected in the pressure range
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8bffb0867fa43dfff4dbcccdfb54d5d7
https://doi.org/10.2138/am-2015-5224
https://doi.org/10.2138/am-2015-5224
Autor:
Tomoya Tamura, Tsuyohito Ito
Publikováno v:
Chemical Physics Letters. 502:173-175
Copper films are deposited on a silicon substrate using plasma-assisted chemical fluid deposition (P-CFD) in supercritical carbon dioxide (scCO 2 ). The deposition rate at the center (peak) of the deposited circle-shape film, as a function of environ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eee21c7edf8d3dbcf379e68ebd9edece
https://doi.org/10.1016/j.cplett.2010.12.038
https://doi.org/10.1016/j.cplett.2010.12.038
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
Defect classification and characterization on mask substrates and blanks can be used to the identify defect sources within the tool and process. Defect reduction has been achieved in SEMATECH’s EUV Mask Blank Development Center (MBDC), aided by suc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a82335b5cc0a2598009578967738eab2
https://doi.org/10.1117/12.2047659
https://doi.org/10.1117/12.2047659
Publikováno v:
Physical Review E. 80
Tsuyohito Ito, Tomoya Tamura, Mark A. Cappelli, and Satoshi Hamaguchi, Physical Review E 80, 067401, 2009
Trajectories of self-sustained laboratory ball lightning, generated by arc discharges with silicon, are investigated for understanding the
Trajectories of self-sustained laboratory ball lightning, generated by arc discharges with silicon, are investigated for understanding the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b1659da183faaef54e6976dd90597988
https://doi.org/10.1103/physreve.80.067401
https://doi.org/10.1103/physreve.80.067401
Autor:
Tomoya Tamura, Seh-Jin Park, Guojing Zhang, Yuta Sato, Kazunori Omata, Hal Kusunose, Andy Ma, Ted Liang
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet lithography (EUVL) is a leading technology to succeed optical lithography for high volume production of 22 nm node and beyond. One of the top risks for EUVL is the readiness of defect-free masks, especially the availability of Mo/
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d330c7053d011448a51c4e32268c36f7
https://doi.org/10.1117/12.824259
https://doi.org/10.1117/12.824259
Autor:
Anwei Jia, Tomoya Tamura, Patrick A. Kearney, Wonil Cho, Chan-Uk Jeon, Hal Kusunose, Eric M. Gullikson, Atsushi Tajima
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet lithography (EUVL) mask blanks must be free of printable defects. The SEMATECH Mask Blank Development Center (MBDC) is focused on driving down the defect density of EUVL mask blanks by providing a collaborative environment for EUV
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7afb1c6ecb79926ee691d24da80d13c3
https://doi.org/10.1117/12.712990
https://doi.org/10.1117/12.712990