Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Tomoya Ori"'
Autor:
Shinichi Ito, Yoko Iwakaji, Daizo Muto, Kotaro Sho, Tomoya Ori, Katsutoshi Kobayashi, Kazunori Iida, Tsukasa Azuma, Hirokazu Kato
Publikováno v:
Journal of Photopolymer Science and Technology. 22:619-623
Non-top coat resists are expected to be compatible with next generation high-speed scanners. Since they contain hydrophobic additives which are eccentrically located near the film surface so that they can form more hydrophobic film surface, they shou
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e4ee5141454623c26c89aeba146c04a0
https://doi.org/10.2494/photopolymer.22.619
https://doi.org/10.2494/photopolymer.22.619
Autor:
Yukio Nishimura, Motoyuki Shima, Koutaro Sho, Takanori Kawakami, Tomoya Ori, Kazunori Iida, Tsukasa Azuma, Daizo Muto, Katsutoshi Kobayashi, Hirokazu Kato, Shinichi Ito, Yuuki Ishii, Tomoharu Fujiwara
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
Subsequent to 45 nm node, immersion lithography using topcoat process is approaching its next step for mass production. However, microfabrication using immersion topcoat leads to increase in cost due to increase in process steps. In order to deal wit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::38ec01cf8b3d60b69eabb877c0691707
https://doi.org/10.1117/12.812475
https://doi.org/10.1117/12.812475