Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Tomoya Oori"'
Publikováno v:
Journal of Nanoscience and Nanotechnology. 9:59-68
Transient events in thin films and interfaces have been studied using the technique of time resolved pump-probe nanosecond Brewster angle microscopy. For p-polarized light there is a minimum reflectivity at the Brewster angle. When the interface is v
Autor:
Shinji Kajimoto, Jonathan Hobley, Tomoya Oori, Sergey Gorelik, Hiroshi Fukumura, Koji Hatanaka, Dirk Hönig
Publikováno v:
Applied Physics A. 93:947-954
A technique is described to observe transient events in thin interfacial films and monolayers. p-polarized light has minimum reflectivity at the Brewster angle. When an interface is viewed with light that is both incident and reflected at the Brewste
Autor:
Hiroshi Fukumura, Jonathan Hobley, Tomoya Oori, Shinji Kajimoto, Thomas Lippert, G. Kopitkovas, Koji Hatanaka
Publikováno v:
Colloids and Surfaces A: Physicochemical and Engineering Aspects. :514-520
A nanosecond time-resolved Brewster angle microscope was developed in order to observe pulsed-laser-induced spinodal de-mixing of binary liquid mixtures of triethylamine (TEA)–water and 2-butoxyethanol (2BE)–water at interfaces. At an air–liqui
Autor:
Tomoya Oori, Kazunori Iida, Keisuke Kikutani, Katsutoshi Kobayashi, Eishi Shiobara, Kentaro Matsunaga, Katsumi Yamamoto, Fumiki Aiso, Koji Hashimoto, Koutarou Sho
Publikováno v:
SPIE Proceedings.
The spacer patterning process is one of the strongest double patterning technology candidates for fabricating 2xnm node semiconductor devices by ultra-low-k1 lithography. However, a severe problem exists with this process, it has an excessive number
Autor:
Yusuke Horiguchi, Hirokazu Kato, Eishi Shiobara, Satoshi Takei, Shinichi Ito, Tomoya Oori, Kentaro Matsunaga, Makoto Muramatsu, Takahiro Kitano, Tomoya Ohashi, Mitsuaki Iwashita
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
The lithography process on topographic substrate is one of the most critical issues for device manufacturing. Topographic substrate-induced focus variation occurs between top position and bottom position in a layer. That is, common depth of focus is
Autor:
Kentaro Matsunaga, Tomoya Oori, Eishi Shiobara, Mitsuaki Iwashita, Daisuke Kawamura, Shinichi Ito, Tetsu Kawasaki, Yuichiro Inatomi, Hirokazu Kato
Publikováno v:
Advances in Resist Materials and Processing Technology XXV.
Line width roughness (LWR) reduction is a critical issue for low k1 ArF immersion lithography. Various approaches such as materials, exposure technology and the track process have been performed for LWR reduction during lithography process. It was re
Autor:
Tomoya Oori, Shinji Kajimoto, Sergey Gorelik, Tokuji Miyashita, Jun Matsui, Jonathan Hobley, Hiroshi Fukumura
Publikováno v:
Biointerphases. 5(3):FA105-FA109
Two-dimensional condensation was initiated in a self-assembled mixed monolayer of spiropyran and octadecanol by a nanosecond laser pulse. The dynamics of the process were monitored using nanosecond pump-probe Brewster angle microscopy. Domain growth