Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Tomotaka Yamada"'
Autor:
Tomotaka Yamada, Katsumi Ohmori, Kensuke Matsuzawa, Daisuke Kawana, Shogo Matsumaru, Fujii Tatsuya, Yoshitaka Komuro
Publikováno v:
Journal of Photopolymer Science and Technology. 29:489-493
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::693b42f3bc529f24982caa40df2627b6
https://doi.org/10.2494/photopolymer.29.489
https://doi.org/10.2494/photopolymer.29.489
Autor:
Tomotaka Yamada, Katsumi Ohmori, Takehiro Seshimo, Tsuyoshi Kurosawa, Tasuku Matsumiya, Hitoshi Yamano, Ken Miyagi
Publikováno v:
SPIE Proceedings.
Directed self-assembly (DSA) of block copolymers (BCPs) with conventional lithography is being thought as one of the potential patterning solution for future generation devices manufacturing. New BCP platform is required to obtain resolution below 10
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ea2227e264ffb9d69aa93b52438c503
https://doi.org/10.1117/12.2218243
https://doi.org/10.1117/12.2218243
Autor:
Fujii Tatsuya, Shogo Matsumaru, Yoshitaka Komuro, Daisuke Kawana, Katsumi Ohmori, Tomotaka Yamada
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII.
Extreme Ultra Violet (EUV) lithography is one of the most promising candidate technologies for the high-volume manufacturing (HVM) of semiconductor devices at the sub-14 nm half pitch lines and spaces (LS) pattern for 7 nm node and beyond. EUV resist
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4c66b906df1e9495df075e72f8d04dd3
https://doi.org/10.1117/12.2218417
https://doi.org/10.1117/12.2218417
Autor:
Koki Yasuda, Tomotaka Yamada, Rio Hosoi, Takayuki Ishikawa, Takamichi Saito, Naoki Takei, Kazushi Takahashi, Ko Takasu
Publikováno v:
AINA
Recently, some commercial websites collect browsing history and device information for use in services they provide. In this paper, we focused on font information that can be obtained via a web browser to determine what kind of software can be identi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4673228a9fbf347856d7fca6167f50b4
https://doi.org/10.1109/aina.2016.55
https://doi.org/10.1109/aina.2016.55
Publikováno v:
BWCCA
Many commercial Websites employ Web browser fingerprinting to track visitors using Hypertext Transfer Protocol (HTTP) headers, JavaScript, and other methods. Although a user can disable JavaScript or utilize a prevention tool to avoid being tracked,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e3890738e3219865913e472a1e7349b7
https://doi.org/10.1109/bwcca.2015.105
https://doi.org/10.1109/bwcca.2015.105
Publikováno v:
BWCCA
Web browser fingerprinting is a method currently used to identify a user's device based on the features of the device and a browser. Although this method has been used for Web tracking, its utilization for risk-based authentication or forensics is ex
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::81b09435e91e80e791e3bb08a6521c2d
https://doi.org/10.1109/bwcca.2015.106
https://doi.org/10.1109/bwcca.2015.106
Publikováno v:
IMIS
Recently, Java Script with HTML5 has become popular for building Website. As a side effect, those technologies can be used to collect a so-called fingerprint that contains hardware information, such as battery status or screen size, of the browser de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::92118d2929a48af5334882a1f21d114e
https://doi.org/10.1109/imis.2015.72
https://doi.org/10.1109/imis.2015.72
High Etch-Resistant Silicon Containing Bilayer Resist:-Lithographic Performance & Outgassing Studies
Autor:
Eric Scott Moyer, Takahashi Hosono, Daisuke Kawana, Kazufumi Sato, Sunlin Hu, Sina Maghoodi, David Lee Wyman, Tomotaka Yamada, Ronald E. Tecklenburg
Publikováno v:
Journal of Photopolymer Science and Technology. 18:365-372
Highly etch resistant poly(silsesquioxane) based resists for ArF lithographic application have been developed. This paper reports on the development of a high etch resistant, high glass transition temperature bilayer resist system capable of imaging
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::76e0aa0fdd71f52edac33ba4ce842051
https://doi.org/10.2494/photopolymer.18.365
https://doi.org/10.2494/photopolymer.18.365