Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Tomoko Kamimoto"'
Autor:
Shigehiro Hara, Yuichi Kawase, Morihisa Hoga, Hidemichi Kawase, Junji Hirumi, Toshio Suzuki, Kokoro Kato, Koki Kuriyama, Satoshi W. Watanabe, Tomoko Kamimoto, Nobuyuki Yoshioka, Yutaka Hojyo
Publikováno v:
SPIE Proceedings.
Mask data preparation (MDP) is a complicated process because many kinds of EB data files and jobdeck data files are used in mask manufacturers and EB data files continue to become bigger. Therefore we have developed unified mask data formats for Vari
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::882539e4a29bffdd66e22f3bc8cfa1cb
https://doi.org/10.1117/12.557738
https://doi.org/10.1117/12.557738
Autor:
Hidemichi Kawase, Tomoko Kamimoto, Junji Hirumi, Koki Kuriyama, Toshio Suzuki, Nobuyuki Yoshioka
Publikováno v:
SPIE Proceedings.
Mask data preparation is a complicated process because many kinds of EB data files and jobdeck data files are used in mask manufacturers and EB data files continue to become bigger. Therefore we have started to develop new mask data format with effic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ba00a852763a366fa12447efc7cf800
https://doi.org/10.1117/12.518436
https://doi.org/10.1117/12.518436
Autor:
Nobuyuki Yoshioka, Koki Kuriyama, Junji Hirumi, Yuichi Kawase, Masa Inoue, Morihisa Hoga, Satoshi W. Watanabe, Yutaka Hojo, Toshio Suzuki, Shigehiro Hara, Hidemuchi Kawase, Tomoko Kamimoto
Publikováno v:
SPIE Proceedings.
Mask data preparation is a complicated process because many kinds of pattern files and jobdeck files flow into mask manufacturers. This situation has a significant impact on data preparation operations especially in mask manufacturers. In this paper,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b191fc0962336781fdfba7c78a7193c5
https://doi.org/10.1117/12.504218
https://doi.org/10.1117/12.504218
Autor:
Junji Hirumi, Koki Kuriyama, Nobuyuki Yoshioka, Hidemuchi Kawase, Tomoko Kamimoto, Hiroji Ogasawara
Publikováno v:
SPIE Proceedings.
Recently as the node size gets smaller into deep sub-micron, both chip designers and mask manufacturers have faced great problems as follows: (1) Explosion of the data size; (2) Further data complexity due to OPC or PSM; (3) Increasing numbers of dat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f4d50f7356e1698edacd9acfaa5f5568
https://doi.org/10.1117/12.504272
https://doi.org/10.1117/12.504272
Autor:
Morihisa Hoga, Masaru Inoue, Shigehiro Hara, Junji Hirumi, Hidemuchi Kawase, Koki Kuriyama, Nobuyuki Yoshioka, Satoshi W. Watanabe, Yuichi Kawase, Tomoko Kamimoto, Yutaka Hojo
Publikováno v:
SPIE Proceedings.
Mask data preparation (MDP) systems are becoming more and more complicated due to increasing demand for higher resolution, and more commonly adopted technique of optical proximity correction (OPC). Conventionally, as a standard format to describe mas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1016136b5ce2138e9e4bf80c3726ca0f
https://doi.org/10.1117/12.467910
https://doi.org/10.1117/12.467910